Instrument/ServiceType:
Reactive Ion Etcher & Inductively Coupled Plasma Etcher
Make/ Model:
PlasmaTherm 540/790 & STS LPX-ICP
Instrument Description:
For anisotropic & high aspect ratio deep etch
Instrument Website URL:
http://cnl.colorado.edu/cnl/index.php?option=com_content&view=article&id=211&Itemid=155
Primary Contact:
Tzu-Min Ou
Email: cnl@colorado.edu
Instrument Location:
Engineering Center, room ECEE271