Direct photomask making

Make/ Model:

Heidelberg DWL 66FS

Instrument Description:

The DWL 66FS laser lithography system is an economical, high resolution pattern generator for low volume mask making and direct writing. The capabilities and flexibility of this system make it the ultimate lithographic research tool in Life Science, Advanced Packaging, MEMS, Micro-Optics, Semiconductor and all other applications that require microstructures. 

The DWL 66FS includes all the features that are needed for successful creation and analysis of your microstructures. It can be used for mask making or direct exposure on basically any flat material coated with photoresist. 

Instrument Website URL:

Primary Contact:

Tzu-Min Ou

Email id:

Instrument Location:

Engineering Center, ECEE271