Mask Aligner and Exposer

Make/ Model:

Karl Suss MJB 3

Instrument Description:

Used in photolithography. Aligns masks to existing structures on a wafer and exposes the photo-resist to transfer the mask design.

Keywords for the Instrument:

Photolithography, Mask, UV

Instrument Website URL:

Primary Contact Name:

David Alchenberger


Phone 303.492.2389

Home Department/Institute:


Home Facility:

JILA Keck Lab

Instrument Location:


Instrument Availability to Campus Users:

Open on a case-by-case basis to the university users outside of the home department

Instrument Availability to External Academic and National Lab Users:

Open on a case-by-case basis to academic and national lab users