Thermal processes

Instrument/ServiceType:

Furnace/(vacuum) Oven/RTA

Instrument Description:

5" quatz tube furnaces that can go up to 1200 degrees Celcius with pure gases (oxygen, hydrogen, argon, forming gas, nitrogen) for thermal anneal, graphene growth, Si thermal oxidation, and dopant diffusion.

Rapid thermal anneal (with argon and nitrogen) is also available.

Primary Contact:

Tzu-Min Ou

Email id: cnl@colorado.edu

Instrument Location:

Engineering Center, ECEE271