Marcel Junige

  • M.Sc. in Electrical Engineering
  • Professional Research Assistant
  • DEPARTMENT OF CHEMISTRY

Marcel continuously pursues his dream of a thriving career in academia.  He currently works as a Professional Research Assistant in the research group of Steven M. George at the University of Colorado Boulder, USA.  He was a Semiconductor Research Corporation (SRC) Research Scholar and successfully completed three Global Research Collaboration (GRC) Nanomanufacturing Materials and Processes (NMP) projects, namely  3288.001: »Selective Thermal Spontaneous Etching or Atomic Layer Etching Using Reaction Parameters, Co-Adsorbates and Surface Inhibition« (Jan – Dec 2025);  3083.001: »Gas-Phase Methods for Selective Thermal Atomic Layer Etching of Si-Based Materials« (Jan 2022 – Dec 2024); and 2871.001: »Area-Selective Deposition of Organic Films using Molecular Layer Deposition and Molecular Layer Etching« (Jan 2019 – Dec 2021).

In 2011, Marcel graduated with a M.Sc. degree in electrical engineering from the Technische Universität Dresden (TUD) in Dresden, Germany.  He received the GlobalFoundries Award 2011 for the best diploma thesis in his year's microelectronics degree program.  After his M.Sc., he secured a 6-month contract under the supervision of Prof. Dr.-Ing. Thomas Mikolajick at the Nano-electronic Materials Laboratory (NaMLab) in Dresden, before receiving a 3-year Ph.D. Innovation Fellowship from the European Social Fund (ESF) and the Free State of Saxony of the Federal Republic of Germany.  At the turn of 2012/13, he stayed for a quarter year as a Visiting Researcher in the ellipsometry group of Prof. Dr. habil. Mathias Schubert at the University of Nebraska–Lincoln, USA.  From 2014 to 2018, he conducted research as a full-time Scientist in the group of Prof. Dr. rer. nat. Johann W. Bartha at TUD on the project »Quantum-Mechanical Device Concepts Including Ultra-Thin Functional ALD Films for Employment in TeraHertz Applications«, funded by the German Research Foundation (DFG), and in close collaboration with Prof. Dr. Christian Wenger from the IHP GmbH – Leibniz Institute for Innovative Microelectronics.

Marcel is an inductive thinker, well-suited for a scientific career.  In total, until now, his advanced expertise in selective, atomic-scale processing (AP)—i.e., atomic layer deposition (ALD), molecular layer deposition (MLD), atomic layer etching (ALE), spontaneous or chemical vapor etching (CVE), area-selective deposition and selective etching—as well as in situ and in vacuo metrology—especially spectroscopic ellipsometry (SE)—is based on more than 15 years of applied experience.  In addition, he has been leading industry collaborations and/or contract research involving liaisons from Intel, Tokyo Electron, IBM, ASM International, Samsung, Infineon, and GlobalFoundries.  Together with Steve George, Marcel has one pending US Patent application for the »Selective Etching of Silicon Dioxide and Silicon Nitride Containing Materials«.

Marcel authored or co-authored more than 60 publications in peer-reviewed journals and at internationally established symposia, conferences, or workshops.  He will give an invited tutorial at the American Vacuum Society (AVS) Area-Selective Deposition Workshop in Albany, NY (2026);  gave an invited talk at the AVS 71st International Symposium & Exhibition in Charlotte, NC (2025);  an invited lecture in the Nebraska Ellipsometry Lecture Series (2025);  an invited poster and pitch at SEMI’s Industry Strategy Symposium in Half Moon Bay, CA (2024);  an invited tutorial at the EFDS Workshop »ALD for Industry« in Dresden (2017);  an invited talk, jointly with Dr. Jonas Sundqvist, at the NaMLab Novel High-k Application Workshop in Dresden (2016);  and an invited lecture at the HERALD Summer School »Atomic Layer Deposition: Method and Applications« in Brescia, Italy (2015).  He also conducts peer reviews for the scientific journals:  Journal of Chemical Physics, Journal of Materials Science, Journal of Vacuum Science & Technology A, Journal of Vacuum Science & Technology B, and Microelectronic Engineering.

From 2011 to 2013, Marcel received comprehensive training and holds the Saxon Certificate in Teaching and Learning in Higher Education (2013).  He gained teaching experience at TUD as an instructor for the courses: »Fundamentals of Electrical Engineering« (winter semester 2011/12) and »Electric and Magnetic Fields« (summer semester 2012).  In addition, he supervised 4 master's theses and 4 interdisciplinary student research projects at TUD.  

Marcel is actively involved in the Organizing Committee for the 1st American Workshop on Ellipsometry in Lincoln, NE (2027) and the Program Committee of the Spectroscopic Ellipsometry (EL) Technical Group for the AVS 72nd International Symposium & Exhibition in Pittsburgh, PA (2026).  He served on the Local Organizing Committee for the 10th International Conference on Spectroscopic Ellipsometry in Boulder, CO (2025) and co-organized the 2nd HERALD Early Career Investigator (ECI) Meeting »Bonding HERALD.ECIs from Ideas to Proposals« in Barcelona, Spain (2018).  He has been an active member of the AVS since 2024, where he has been involved in the leadership of the EL Technical Group since 2025;  the North American Ellipsometry Association (NAEA) since its formation in 2023;  as well as the Arbeitskreis Ellipsometrie – Paul Drude e.V. (AKE) since 2012, where he served as an elected member of the extended executive board (2014–2016).  He was a student member of SPIE, the international society for optics and photonics (2015), Deutsche Physikalische Gesellschaft e.V. (DPG) (2014–2018), AVS (2013, 2015), and Verband der Elektrotechnik Elektronik Informationstechnik e.V. (VDE) (2011–2018).

Publications with the Research Group

4.   Samantha M. Rau, Rebecca J. Hirsch, Marcel Junige, Andrew S. Cavanagh, Antonio L. P. Rotondaro, Hanna Paddubrouskaya, Kate H. Abel, and Steven M. George, “Strongly and Weakly Adsorbed H2O Layer Thicknesses on Hydroxylated SiO2 Surfaces versus H2O Pressure at Various Substrate Temperatures”, J. Phys. Chem. C129, 1666-1677 (2025).

3.   Marcel Junige and Steven M. George, “Selectivity Between SiO2 and SiNx During Thermal Atomic Layer Etching Using Al(CH3)3/HF and Spontaneous Etching Using HF & Effect of HF+NH3 Co-Dosing”, Chem. Mater.36, 6950-6960 (2024).

2.   Michael A. Collings, Marcel Junige, Andrew S. Cavanagh, Victor Wang, Andrew C. Kummel, and Steven M. George, “Electron-Enhanced Atomic Layer Deposition of Ru Thin Films Using Ru(DMBD)(CO)3 and Effect of Forming Gas Anneal”, J. Vac. Sci. Technol. A41, 062408 (2023).

1.   Marcel Junige and Steven M. George, “Area-Selective Molecular Layer Deposition of Nylon 6,2 Polyamide:  Growth on Carbon and Inhibition on Silica”, J. Vac. Sci. Technol. A39, 023204 (2021).