The Steven M. George research group concentrates on surface chemistry, thin-film growth & etching, and nanoscale engineering.
We focus on atomic layer deposition (ALD), atomic layer etching (ALE), and molecular layer deposition (MLD).
We develop the science and engineering of atomic layer processing (ALP).
In the research group, we welcome the diversity of students, researchers, and collaborators.
We strive for an accessible, inclusive, and equitable work environment.