The Steven M. George research group is well equipped to study surface chemistry, thin-film growth and etching, and thin-film properties.  Many of these studies are focused on atomic layer deposition (ALD), atomic layer etching (ALE), and molecular layer deposition (MLD).  Thin-film growth and etching investigations using ALD, ALE, and MLD are conducted in a variety of home-built reactors.  Some of these analyses are performed in situ during thin-film growth and etching.  Other studies are conducted ex situ after removing the sample from the reactor.  All of the techniques and equipment described below are available within the research group.