Nanoimprint Lithography (NIL) System

NIL system

 

 

 

An Eitre 3 NIL System (Obducat, Sweden) hosted in a class 100 soft-wall clean room closure. 

The equipment provides thermal embossing and step-and-flash nanoimprint, both independently and simultaneously.

The equipment provides precisely controlled temperature and pressure, with extremely uniform residual layer with pattern size down to 10 nm. 

 

 

 

 


Atomic Force Microscope (AFM)

AFM    

   

     Nanoscope IV SPM from Bruker.  This system is based on Veeco’s SPM model Dimension 3100.

     Equipped with both open-loop and close-loop heads.

 

 


Nanoscale Thermal Analysis (Nano-TA)

Nano-TA

    

         Anasys Nano-TA 2 system (now Bruker)      

         Coupled with the AFM equipment. 

         Provide measurements of Tg or Tm with nanoscale resolution (up to 450 oC)

          

 


Dynamic Mechanical Analysis (DMA)

DMA  

 

       TA Instrument, Q800 model

 

 

 

 

 


Rheometer

AR-G2 rheometer

 

 

          

           TA Instrument, AR-G2 Model

 

 

 

 

 

 

 


Deep UV Light Source

Deep UV light source     

 

          OAI Deep UV Flood Exposure

 

 

 


Collimated UV curing system

UV curing system

   

 

    6986 EXFO OMNICURE S2000 UV CURE

 

 

 

 


Microscope Hot Stage

microscope heater

         

 

         Instec STC 200 model

 

 

 


Membrane Filtration Capabilities

Our lab has extensive filtration equipment and facilities for membrane research, including:

  • Varies of bench scale, stirred dead-end filtraiton cells with pressure up to 1000 psi
  • Liquid cells suitable for both diffusion and pressure-driven crossflow or normal flow up to 400 psi 
  • Low (up to 200 psi) and high (1000 psi) pressure bench scale crossflow membrane units