Maruf's paper is now published on Journal of Membrane Science!

In this study titled "Use of nanoimprinted surface patterns to mitigate colloidal deposition on ultrafiltration membranes", we demonstrate that submicron patterns can be successfully imprinted onto a commercial polysulfone ultrafiltration membrane surface using nanoimprint lithography (NIL) without sacrificing much of its permeability properties. The presence of these patterns led to significantly improved deposition resistance during filtration of colloidal silica particle suspensions. These results suggest a promising chemical-free manufacturing route to achieve antifouling properties for commercial ultrafiltration membrane.