Quantum and Nano Device Fabrication Training
GenISys BEAMER Hands-on Training Workshop
Thursday, Nov. 6. 9 a.m.-1:30 p.m. (end time flexible), SEEC S225
This course introduces attendees to the BEAMER interface and tools for optimizing electron beam lithography (EBL) patterning on the COSINC’s 100 kV EBL system (EBPG5150plus). Participants will learn to create flows, inspect/prepare data, and import/export layouts into machine format.
🌟 Topics:
- Basics of Data Preparation
- Layout Operations: Import, Bias, Heal, Extract, Booleans
- GPF Formatter and primitives
- Field Control: Multipass, Overlap, Sorting
- Electron Scattering simulations
- Proximity Effect Correction methods
- Using Python with BEAMER
- Application cases (optional)
LIMITED TO 20 PARTICIPANTS.
Due to the hands-on format, registration is first-come, first-served.
Windows computer with a wheeled mouse recommended temporary license will be provided; Mac computers with Windows emulators are not supported.
Submission Deadline
If you have a specific application you would like to discuss, please email it to us ahead of time: any relevant GDS pattern, process data, including material stack PSF info. To review your specific application during training, send relevant files (flows, PSFs, CAD) to chuang.qu@colorado.edu by Wednesday, Oct 29.
INSTRUCTOR: Marvin Zai, PhD, Applications Engineer at GenISys
He specializes in computational lithography, physics simulation, and image analysis, with prior experience spanning semiconductor device fabrication, MEMS, and optical systems. Email: zai@genisys-gmbh.com