The Archive Below Contains Selected Publications from the Research Group with PDF Links.

495.     Brian C. Welch, Emma N. Antonio, Thomas P. Chaney, Olivia M. McIntee, Joseph Strzalka, Victor M. Bright, Alan R. Greenberg, Tamar Segal-Peretz, Michael Toney, and Steven M. George, “Building Semipermeable Films One Monomer at a Time: Structural Advantages via Molecular Layer Deposition vs Interfacial Polymerization”, Chem. Mater. 36, 1362-1374 (2024). 

494.     Taewook Nam, Troy A. Colleran, Jonathan L. Partridge, Andrew S. Cavanagh, and Steven M. George, “Thermal Atomic Layer Etching of Molybdenum Using Sequential Oxidation and Deoxychlorination Reactions”, Chem. Mater. 36, 1449-1458 (2024).

493.     Jack T. Widmer and Steven M. George, “Al₂O₃ Atomic Layer Deposition on a Porous Matrix of Carbon Fibers (FiberForm) for Oxidation Resistance”, J. Vac. Sci. Technol. A 41, 062412 (2023).

492.     Michael A. Collings, Marcel Junige, Andrew S. Cavanagh, Victor Wang, Andrew C. Kummel, and Steven M. George, “Electron-Enhanced Atomic Layer Deposition of Ru Thin Films Using Ru(DMBD)(CO)₃ and Effect of Forming Gas Anneal”, J. Vac. Sci. Technol. A 41, 062408 (2023).

491.     Taewook Nam, Jonathan L. Partridge, and Steven M. George, “Thermal Atomic Layer Etching of Zinc Sulfide Using Sequential Trimethylaluminum and HF Exposures:  Evidence for a Conversion Mechanism”, Chem. Mater. 35, 6671-6681 (2023).

490.     Jonathan L. Partridge, Aziz I. Abdulagatov, Varun Sharma, Jessica A. Murdzek, Andrew S. Cavanagh, and Steven M. George, “Thermal Atomic Layer Etching of CoO Using Acetylacetone and Ozone:  Evidence for Changes in Oxidation State and Crystal Structure During Sequential Exposures”, Appl. Surf. Sci. 638, 157923 (2023).

489.     Jonas C. Gertsch, Zachary C. Sobell, Andrew S. Cavanagh, Harsono Simka and Steven M. George, “Electron-Enhanced SiO₂ Atomic Layer Deposition at 35°C Using Disilane and Ozone or Water as Reactants”, J. Vac. Sci. Technol. A 41, 043404 (2023).

488.     Behnam Moeini, Tahereh Avval, Hidde Brongersma, Stanislav Průša, Pavel Bábík, Elena Vaníčková, Brian R Strohmeier, David S Bell, Dennis Eggett, Steven M George, Matthew R Linford, “Area-Selective Atomic Layer Deposition of ZnO on Si/SiO₂ Using Tris(trimethylamino)methylsilane”, Materials 16, 4688 (2023).

487.     Jessica A. Murdzek, Ann Lii-Rosales, and Steven M. George, “Thermal Atomic Layer Etching of Cobalt Using Sulfuryl Chloride for Chlorination and Tetramethylethylenediamine or Trimethylphosphine for Ligand Addition”, J. Vac. Sci. Technol. A 41, 032603 (2023). 

486.     Jonathan L. Partridge, Jessica A. Murdzek, Virginia L. Johnson, Andrew S. Cavanagh, Andreas Fischer, Thorsten Lill, Sandeep Sharma, and Steven M. George, “Thermal Atomic Layer Etching of CoO, ZnO, Fe₂O₃, and NiO by Chlorination and Ligand Addition Using SO₂Cl₂ and Tetramethylethylenediamine”, Chem. Mater. 35, 2058-2068 (2023).

485.     Jonas C. Gertsch, Jonathan L. Partridge, Austin M. Cano, Joel W. Clancey, Victor M. Bright, Steven M. George, “Thermal Atomic Layer Etching of VO₂ Using Sequential BCl₃ and SF₄ Exposures:  Observation of Conversion, Ligand-Exchange, and Oxidation State Changes”, J. Vac. Sci. Technol. A 41, 012603 (2023).

484.     Zachary C. Sobell and Steven M. George, “Electron-Enhanced Atomic Layer Deposition of Titanium Nitride Films Using an Ammonia Reactive Background Gas”, Chem. Mater. 34, 9624-9633 (2022).

483.     Ann Lii-Rosales, Virginia L. Johnson, Andrew S. Cavanagh, Andreas Fischer, Thorsten Lill, Sandeep Sharma, and Steven M. George, “Effectiveness of Different Ligands on Silane Precursors for Ligand-Exchange to Etch Metal Fluorides”, Chem. Mater. 34, 8641-8653 (2022).

482.     Austin M. Cano, Jonathan L. Partridge and Steven M. George,  “Thermal Atomic Layer Etching of Al₂O₃ Using Sequential HF and BCl₃ Exposures:  Evidence for Combined Ligand-Exchange and Conversion Mechanisms”, Chem. Mater. 34, 6440-6449 (2022). 

481.     Olivia M. McIntee, Brian C. Welch, Alan R. Greenberg, Steven M. George and Victor M. Bright, “Elastic Modulus of Polyamide Thin Films Formed by Molecular Layer Deposition”, Polymer 255, 125167 (2022).

480.     Ann Lii-Rosales, Virginia L. Johnson, Sandeep Sharma, Andreas Fischer, Thorsten Lill, and Steven M. George, “Volatile Products from Spontaneous Etching of NiCl₂, PdCl₂ and PtCl₂ by Ligand Addition with P(CH₃)₃”, J. Phys. Chem. C. 126, 8287-8295 (2022).

479.     Austin M. Cano, Ann Lii-Rosales and Steven M. George, “Thermal Atomic Layer Etching of Aluminum Nitride Using HF or XeF₂ for Fluorination and BCl₃ for Ligand Exchange”, J. Phys. Chem. C. 126, 6990-6999 (2022).

478.     M. Hoffmann J. A. Murdzek, S. M. George, S. Slesazeck, U. Schroeder, and T. Mikolajick, “Atomic Layer Etching of Ferroelectric Hafnium Zirconium Oxide Thin Films Enables Giant Tunneling Electroresistance”, Appl. Phys. Lett. 120, 122901 (2022).

477.     Austin M. Cano, Suresh Kondati Natarajan, Jonathan L. Partridge, Simon D. Elliot, and Steven M. George^{, “}Spontaneous Etching of B₂O₃ by HF Gas Studied Using Infrared Spectroscopy, Mass Spectrometry and Density Functional Theory”, J. Vac. Sci. Technol. A 40, 022601 (2022).

476.     Jessica A. Murdzek, Ann Lii-Rosales, and Steven M. George, “Thermal Atomic Layer Etching of Nickel Using Sequential Chlorination and Ligand-Addition Reactions”, Chem. Mater.  33, 9174-9183 (2021).

475.     Suresh Kondati Natarajan, Austin M. Cano, Jonathan L. Partridge, Steven M. George and Simon D. Elliott, “Prediction and Validation of Process Window for Atomic Layer Etching:  HF Exposure on TiO₂”, J. Phys. Chem. C 125, 25589-25599 (2021).

474.     Jonas C. Gertsch, Emanuele Sortino, Victor M. Bright, and Steven M. George^, “Deposit and Etchback Approach for Ultrathin Al₂O₃ Films with Low Pinhole Density Using Atomic Layer Deposition and Atomic Layer Etching”, J. Vac. Sci. Technol. A 39, 062602 (2021).

473.     Ann Lii-Rosales, Andrew S. Cavanagh, Andreas Fischer, Thorsten Lill and Steven M. George, “Spontaneous Etching of Metal Fluorides Using Ligand-Exchange Reactions: Landscape Revealed by Mass Spectrometry ”, Chem. Mater. 33, 7719-7730 (2021). 

472.     Brian C. Welch, Olivia M. McIntee, Tyler J. Myers, Alan R. Greenberg, Victor M. Bright and Steven M. George, “Molecular Layer Deposition for the Fabrication of Desalination Membranes with Tunable Metrics”, Desalination 520, 115334 (2021).

471.     S.M. George, "Thermal Atomic Layer Etching of Microelectronic Materials", Extended Abstract, IEEE Xplore, 5th IEEE Electron Devices Technology and Manufacturing Conference (EDTM), April 8-11, 2021.

470.     Tyler J. Myers, James A. Throckmorton, Rebecca A. Borrelli, Malcolm O’Sullivan, Tukaram Hatwar and Steven M. George, “Smoothing Surface Roughness Using Al₂O₃ Atomic Layer Deposition”, Appl. Surf. Sci. 569, 150878 (2021).

469.     Tyler J. Myers and Steven M. George, “Molecular Layer Deposition of Nylon 2,6 Polyamide Polymer on Flat and Particle Substrates in an Isothermal Rotary Reactor”, J. Vac. Sci. Technol. A. 39, 052405 (2021).

468.     Zachary C. Sobell, Andrew S. Cavanagh, David R. Boris, Scott G. Walton, and Steven M. George, “Hollow Cathode Plasma Electron Source for Low Temperature Deposition of Cobalt Films by Electron-Enhanced Atomic Layer Deposition”, J. Vac. Sci. Technol. A. 39, 042403 (2021).

467.     Jessica A. Murdzek, Adarsh Rajashekhar, Raghuveer S. Makala, and Steven M. George, “Thermal Atomic Layer Etching of Amorphous and Crystalline Al₂O₃ Films”, J. Vac. Sci. Technol. A. 39, 042602 (2021).

466.     Andreas Fischer, Aaron Routzahn, Steven M. George, Thorsten Lill, “Thermal Atomic Layer Etching: A Review”, J. Vac. Sci. Technol. A. 39, 030801 (2021).

465.     Aziz I. Abdulagatov, Varun Sharma, Jessica A. Murdzek, Andrew S. Cavanagh, and Steven M. George, “Thermal Atomic Layer Etching of Germanium-Rich SiGe Using an Oxidation and “Conversion-Etch” Mechanism”, J. Vac. Sci. Technol. A 39, 022602 (2021).

464.     Marcel Junige and Steven M. George, “Area-Selective Molecular Layer Deposition of Nylon 6,2 Polyamide:  Growth on Carbon and Inhibition on Silica”, J. Vac. Sci. Technol. A 39, 023204 (2021).

463.     T. J. Myers, A. M. Cano, D. K. Lancaster, J. W. Clancey and S. M. George, “Conversion Reactions in Atomic Layer Processing with Emphasis on ZnO Conversion to Al₂O₃ by Trimethylaluminum”, J. Vac. Sci. Technol. A. 39, 021001 (2021)).

462.     Neha Mahuli, Andrew S. Cavanagh and Steven M. George, “Atomic Layer Deposition of Hafnium and Zirconium Oxyfluoride Thin Films”, J. Vac. Sci. Technol. A. 39, 022403 (2021).

461.     David R. Zywotko, Omid Zandi, Jacques Faguet, Paul R. Abel and Steven M. George, “ZrO₂ Monolayer as a Removable Etch Stop Layer for Thermal Al₂O₃ Atomic Layer Etching using Hydrogen Fluoride and Trimethylaluminum”, Chem. Mater. 32, 10055-10065 (2020).

460.     Brian C. Welch, Olivia McIntee, Anand B. Ode, Bonnie B. McKenzie, Alan R. Greenberg, Victor M. Bright and Steven M. George, “Continuous Polymer Films Deposited on Top of Porous Substrates Using Plasma-Enhanced Atomic Layer Deposition and Molecular Layer Deposition”, J. Vac. Sci. Technol. A 38, 052409 (2020).

459.     Younghee Lee, Nicholas R. Johnson and Steven M. George, “Thermal Atomic Layer Etching of Gallium Oxide Using Sequential Exposures of HF and Various Metal Precursors”, Chem. Mater. 32, 5937-5948 (2020).

458.     Steven M. George, “Mechanisms of Thermal Atomic Layer Etching”, Acc. Chem. Res. 53, 1151-1160 (2020).

457.     Matthias J. Young, Nicholas M. Bedford, Angel Yanguas-Gil, Steven Letourneau, Matthew Coile, David J. Mandia,  Bachir Aoun, Andrew S. Cavanagh, Steven M. George and Jeffrey W. Elam, "Probing the Atomic-Scale Structure of Amorphous Aluminum Oxide Grown by Atomic Layer Deposition", ACS Appl. Mater. & Interfaces 12, 22804-22814 (2020).

456.     G.N. Parsons, J.W. Elam, S.M. George, S. Haukka, H. Jeon, W.M.M. Kessels, M. Leskelä, P. Poodt, M. Ritala and S.M. Rossnagel, “Erratum: History of Atomic Layer Deposition and its Relationship with the American Vacuum Society” [J. Vac. Soc. Technol. A 31, 050818 (2013)]”, J. Vac. Soc. Technol. A 38, 037001 (2020).

455.     Aziz I. Abdulagatov and Steven M. George, “Thermal Atomic Layer Etching of Silicon Nitride Using an Oxidation and “Conversion Etch” Mechanism”, J. Vac. Sci. Technol. A. 38, 022607 (2020).

454.     Jessica A. Murdzek and Steven M. George, “Effect of Crystallinity on the Thermal Atomic Layer Etching of Hafnium Oxide, Zirconium Oxide and Hafnium Zirconium Oxide”, J. Vac. Sci. Technol. A 38, 022608 (2020).

453.     Neha Mahuli, Andrew S. Cavanagh and Steven M. George, “Atomic Layer Deposition of Aluminum Oxyfluoride (AlO_xF_y) Thin Films with Tunable Stoichiometry”, J. Vac. Sci. Technol. A 38, 022407 (2020).

452.     Andreas Fischer, Aaron Routzahn, Younghee Lee, Thorsten Lill and Steven M. George, “Thermal Etching of AlF₃ and Thermal Atomic Layer Etching of Al₂O₃”, J. Vac. Sci. Technol. A. 38, 022603 (2020).

451.     Joel W. Clancey, Andrew S. Cavanagh, James E.T. Smith, Sandeep Sharma and Steven M. George, “Volatile Etch Species Produced During Thermal Al₂O₃ Atomic Layer Etching”, J. Phys. Chem. C 124, 287-299 (2020).

450.     Jessica A. Murdzek and Steven M. George, “Thermal Atomic Layer Etching of Amorphous and Crystalline Hafnium Oxide, Zirconium Oxide, and Hafnium Zirconium Oxide”, Proceedings of 2019 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA), April 22-25, 2019, Hsinchu, Taiwan, IEEE Xplore Digital Library.

449.     Zachary C. Sobell, Andrew S. Cavanagh and Steven M. George, “Growth of Cobalt Films at Room Temperature Using Sequential Exposures of Cobalt Tricarbonyl Nitrosyl and Low Energy Electrons”, J. Vac. Sci. Technol. A 37, 060906 (2019).

448.     Cosima Hirschberg, Nikolaj Sølvkær Jensen, Johan Boetker, Anders Østergaard Madsen, Tommi O. Kääriäinen, Marja-Leena Kääriäinen, Pekka Hoppu, Steven M. George, Matti Murtomaa, Changquan Calvin Sun, Jens Risbo and Jukka Rantanen, “Improving Powder Characteristics by Surface Modification Using Atomic Layer Deposition”, Org. Process Res. Dev. 23, 2362-2368 (2019).

447.     Younghee Lee and Steven M. George, “Thermal Atomic Layer Etching of Al₂O₃, HfO₂, and ZrO₂ Using Sequential Hydrogen Fluoride and Dimethylaluminum Chloride Exposures”, J. Phys. Chem. C 123, 18455-18466 (2019).

446.     Nicholas R. Johnson, Jennifer K. Hite, Michael A. Mastro, and Charles. R. Eddy, Jr. and Steven M. George, “Thermal Atomic Layer Etching of Crystalline GaN Using Sequential Exposures of XeF₂ and BCl₃”, Appl. Phys. Lett. 114, 243103 (2019).

445.     Wenjie Lu, Younghee Lee, Jonas C. Gertsch, Jessica A. Murdzek, Andrew S. Cavanagh, Lisa Kong, Jesús A. del Alamo, and Steven M. George, “In situ Thermal Atomic Layer Etching for Sub-5 nm InGaAs Multi-gate MOSFETs”, Nano Lett. 19, 5159-5166 (2019).

444.     Jasmine M. Wallas, Brian C. Welch, Yikai Wang, Jun Liu, Simon E. Hafner, Rui Qiao, Taeho Yoon, Yang-Tse Cheng, Steven M. George and Chunmei Ban, “Spatial Molecular Layer Deposition of Ultrathin Polyamide to Stabilize Silicon Anodes in Lithium-Ion Batteries”, ACS Appl. Energy Mater. 2, 4135-4143 (2019).

443.     Austin M. Cano, Amy E. Marquardt, Jaime W. DuMont and Steven M. George, “Effect of HF Pressure on Thermal Al₂O₃ Atomic Layer Etch Rates and Al₂O₃ Fluorination”, J. Phys. Chem. C 123, 10346-10355 (2019).

442.     Jonas C. Gertsch, Austin M. Cano, Victor M. Bright, and Steven M. George, “SF₄ as the Fluorination Reactant for Al₂O₃ and VO₂ Thermal Atomic Layer Etching”, Chem. Mater. 31, 3624-3635 (2019).

441.     Wenjie Lu, Younghee Lee, Jessica Murdzek, Jonas Gertsch, Alon Vardi, Lisa Kong, Steven M. George, and Jesús A. del Alamo, “First Transistor Demonstration of Thermal Atomic Layer Etching: InGaAs FinFETs with sub-5 nm Fin-width Featuring in situ ALE-ALD”, Extended Abstract for 2018 IEEE International Electron Devices Meeting (IEDM), Dec. 1-5, 2018, San Francisco, CA., pages 39.1.1-39.1.4.

440.     Aziz I. Abdulagatov and Steven M. George, “Thermal Atomic Layer Etching of Silicon Using O₂, HF and Al(CH₃)₃ as the Reactants”, Chem. Mater. 30, 8465-8475 (2018).

439.     Younghee Lee and Steven M. George, “Thermal Atomic Layer Etching of HfO₂ Using HF for Fluorination and TiCl₄ for Ligand-Exchange”, J. Vac. Sci. Technol. A 36, 061504 (2018).

438.     David R. Zywotko, Jacques Faguet and Steven M. George, “Rapid Atomic Layer Etching of Al₂O₃ Using Sequential Exposures of Hydrogen Fluoride and Trimethylaluminum with No Purging”, J. Vac. Sci. Technol. A 36, 061508 (2018). 

437.     Jasmine M. Wallas, Huaxing Sun, Matthias J. Young and Steven M. George, “Electron-Decoupled Ion Transfer in Thin Film Sodium Manganese Oxide for Efficient Capacitive Deionization”, J. Electrochem. Soc. 165, A1-A10 (2018).

436.     Jaclyn K. Sprenger, Huaxing Sun, Andrew S. Cavanagh, Alexana Roshko, Paul T. Blanchard and Steven M. George, “Electron-Enhanced Atomic Layer Deposition (EE-ALD) of Boron Nitride Thin Films at Room Temperature and 100°C”, J. Phys. Chem. C 122, 9455-9464 (2018).  

435.     Alexander S. Yersak, Kashish Sharma, Jasmine M. Wallas, Arrelaine A. Dameron, Xuemin Li, Yongan Yang, Katherine E. Hurst, Chunmei Ban, Robert C. Tenent and Steven M. George, “Spatial Atomic Layer Deposition for Coating Flexible Porous Li-Ion Battery Electrodes”, J. Vac. Sci. Technol. A 36, 01A123 (2018).

434.     Jaclyn K. Sprenger, Huaxing Sun, Andrew S. Cavanagh and Steven M. George, “Electron-Enhanced Atomic Layer Deposition of Silicon Thin Films at Room Temperature”, J. Vac. Sci. Technol. A 36, 01A118 (2018).

433.     D. J. Higgs, J. W. DuMont, K. Sharma and S. M. George, “Spatial Molecular Layer Deposition of Polyamide Thin Films on Flexible Polymer Substrates Using a Rotating Cylinder Reactor”, J. Vac. Sci. Technol. A 36, 01A117 (2018).

432.    Jaana Hautala, Tommi Kääriäinen, Pekka Hoppu, Marianna Kemell, Jyrki Heinämäki, David Cameron, Steven George, Anne Mari Juppo, “Atomic Layer Deposition – A Novel Method for the Ultrathin Coating of Minitablets”, Int. J. Pharm. 531, 47-58 (2017).

431.     Nicholas R. Johnson and Steven M. George, “WO₃ and W Thermal Atomic Layer Etching Using “Conversion-Fluorination” and “Oxidation-Conversion-Fluorination” Mechanisms” ACS Appl. Mater. Interfaces 9, 34435-34447 (2017).

430.     Younghee Lee and Steven M. George, “Thermal Atomic Layer Etching of Titanium Nitride Using Sequential, Self-Limiting Reactions:  Oxidation to TiO₂ and Fluorination to Volatile TiF₄”, Chem. Mater. 29, 8202-8210 (2017).

429.     Diane K. Lancaster, Huaxing Sun and Steven M. George, Atomic Layer Deposition of Zn(O,S) Alloys Using Diethylzinc with H₂O and H₂S:  Effect of Exchange Reactions, J. Phys. Chem. C 121, 18643-18652 (2017).

428.     Tommi O. Kääriäinen, Marianna Kemell, Marko Vehkamäki, Marja-Leena Kääriäinen, Alexandra Correia, Hélder A. Santos, Luis M. Bimbo, Jouni Hirvonen, Pekka Hoppu, Steven M. George, David C. Cameron, Mikko Ritala, Markku Leskelä, “Surface Modification of Acetaminophen Particles by Atomic Layer Deposition”,  Int. J. Pharm. 525, 160-174 (2017).

427.     K. Ishikawa, K. Karahashi, M. Honda, M. Matsui, J.P. Chang, S.M. George, W.M.M. Kessels, H.J. Lee, S. Tinck, J.H. Um, T. Tatsumi, S. Higashi and K. Kinoshita, “Progress and Prospects in Nanoscale Dry Processes - How Can We Control Atomic Layer Reactions?”, Jpn. J. Appl. Phys. 56, 06HA02 (2017).

426.     Yun Zhou, Younghee Lee, Huaxing Sun, Jasmine M. Wallas, Steven M. George and Ming Xie, “Coating Solution for High-Voltage Cathode:  AlF₃ Atomic Layer Deposition for Free-standing LiCoO₂ Electrodes with High Energy Density and Excellent Flexibility”, ACS Appl. Mater. Interfaces 9, 9614-9619 (2017).

425.     Jaime W. DuMont, Amy E. Marquardt, Austin M. Cano and Steven M. George, “Thermal Atomic Layer Etching of SiO₂ by a “Conversion-Etch” Mechanism Using Sequential Reactions of Trimethylaluminum and Hydrogen Fluoride”, ACS Appl. Mater. & Interfaces 9, 10296-10307 (2017).

424.     David R. Zywotko and Steven M. George, “Thermal Atomic Layer Etching of ZnO by a “Conversion-Etch” Mechanism Using Sequential Exposures of Hydrogen Fluoride and Trimethylaluminum”, Chem. Mater. 29, 1183-1191 (2017).

423.     Jaime W. DuMont and Steven M. George, “Competition between Al₂O₃ Atomic Layer Etching and AlF₃ Atomic Layer Deposition Using Sequential Exposures of HF and Trimethylaluminum”, J. Chem. Phys. 146, 052819 (2017).

422.     Matthias J. Young, Hans-Dieter Schnabel, Aaron M. Holder, Steven M. George and Charles B. Musgrave, “Band-Diagram and Rate Analysis of Thin-Film Spinel LiMn₂O₄ Formed by Electrochemical Conversion of ALD Grown MnO”, Adv. Funct. Mater. 26, 7895-7907 (2016).

421.     Younghee Lee, Craig Huffman and Steven M. George, “Selectivity in Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reactions”, Chem. Mater. 28, 7657-7665 (2016).

420.     Jaclyn K. Sprenger, Andrew S. Cavanagh, Huaxing Sun, Kathryn J. Wahl, Alexana Roshko and Steven M. George, “Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions”, Chem. Mater. 28, 5282-5294 (2016).

419.     Matthias J. Young, Christopher D. Hare, Andrew C. Cavanagh, Charles B. Musgrave and Steven M. George, “Rapid Growth of Crystalline Mn₅O₈ by Self-Limited Multilayer Deposition using Mn(EtCp)₂ and O₃", ACS Appl. Mater. Interfaces 8, 18560-18569 (2016).

418.     Chunmei Ban and Steven M. George, “Molecular Layer Deposition for Surface Modification of Lithium-Ion Battery Electrodes”, Adv. Mater. Interfaces 3, 1600762 (2016).

417.     Nicholas R. Johnson, Huaxing Sun, Kashish Sharma and Steven M. George, “Thermal Atomic Layer Etching of Crystalline Aluminum Nitride Using Sequential, Self-Limiting HF and Sn(acac)₂ Reactions and Enhancement by H₂ and Ar Plasmas”, J. Vac. Sci. Technol. A 34, 050603 (2016).

416.     Daniela Molina Piper, Younghee Lee, Seoung-Bum Son, Tyler Evans, Feng Lin, Dennis Nordlund, Xingcheng Xiao, Steven M. George, Se-Hee Lee, Chunmei Ban, “Cross-linked aluminum dioxybenzene coating for stabilization of silicon electrodes”, Nano Energy 22, 202-210 (2016).

415.     Steven M. George and Younghee Lee, “Prospects for Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reaction”, ACS Nano 10, 4889-4894 (2016).

414.     Younghee Lee, Jaime W. DuMont and Steven M. George, “Trimethylaluminum as the Metal Precursor for the Atomic Layer Etching of Al₂O₃ Using Sequential, Self-Limiting Thermal Reactions”, Chem. Mater. 28, 2994-3003 (2016).

413.     Younghee Lee, Huaxing Sun, Matthias J. Young and Steven M. George, “Atomic Layer Deposition of Metal Fluorides Using HF-Pyridine as the Fluorine Precursor”, Chem. Mater. 28, 2022-2032 (2016).

412.     Ming Xie, Xiang Sun, Hongtao Sun, Tim Porcelli, Steven M. George, Yun Zhou and Jie Lian, “Stabilizing an Amorphous V₂O₅/Carbon Nanotube Paper Electrode with Conformal TiO₂ Coating by Atomic Layer Deposition for Lithium Ion Batteries”, J. Mater. Chem. A 4, 537-544 (2016).

411.     Kashish Sharma, Dmitri Routkevitch, Natalia Varaksa and Steven M. George, “Spatial Atomic Layer Deposition on Flexible Porous Substrates:  ZnO on Anodic Aluminum Oxide Films and Al₂O₃ on Li Ion Battery Electrodes”, J. Vac. Sci. Technol. A 34, 01A146 (2016).

410.     Ming Xie, Xiang Sun, Changgong Zhou, Hongtao Sun, Tao Hu, Jie Lian and Steven M. George, “Amorphous Ultrathin SnO₂ Films by Atomic Layer Deposition on Graphene Network as Highly Stable Anodes for Lithium Ion Batteries”, ACS Appl. Mater. Interfaces 7, 27735-27742 (2015).

409.     Matthias J. Young, Markus Neuber, Andrew C. Cavanagh, Huaxing Sun, Charles B. Musgrave and Steven M. George, “Sodium Charge Storage in Thin Films of MnO₂ Derived by Electrochemical Oxidation of MnO Atomic Layer Deposition Films”, J Electrochem. Soc. 162, A2753-A2761 (2015). 

408.     Nathan T. Eigenfeld, Jonas C. Gertsch, George D. Skidmore, Steven M. George, Victor M. Bright, “Electrical and Thermal Conductivity in Ultra-Thin Freestanding Atom Layer Deposited W Nanobridges”, Nanoscale 7, 17923-17928 (2015).

407.     Anna M. Wise, Chunmei Ban, Johanna Nelson Weker, Sumohan Misra, Andrew S. Cavanagh, Zhuangchun Wu, Zheng Li, M. Stanley Whittingham, Kang Xu, Steven M. George and and Michael F. Toney, “Effect of Al₂O₃ Coating on Stabilizing LiNi₀.₄Mn_0.4Co_0.2O₂ Cathodes”, Chem. Mater. 27, 6146-6154 (2015). 

406.     Younghee Lee, Jaime W. DuMont and Steven M. George, “Atomic Layer Etching of AlF₃ Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)₂ and Hydrogen Fluoride” J. Phys. Chem. C 119, 25385-25393 (2015).

405.     Y. Lee, J.W. DuMont, and S.M. George, “Atomic Layer Etching Using Thermal Reactions:  Atomic Layer Deposition in Reverse” ECS Transactions 69 (7) 233-241 (2015).

404.     Langli Luo, Hui Yang, Pengfei Yan, Jonathan J. Travis, Younghee Lee, Nian Liu, Daniela Molina Piper, Se-Hee Lee, Peng Zhao, Steven M. George, Ji-Guang Zhang, Yi Cui, Sulin Zhang, Chunmei Ban, and Chong-Min Wang, “Surface-Coating Regulated Lithiation Kinetics and Degradation in Silicon Nanowires for Lithium Ion Battery”, ACS Nano 9, 5559-5566 (2015).

403.     Yuguang Ma, Julibeth M. Martinez de la Hoz, Ivette Angarita, Jose M. Berrio-Sanchez, Laura Benitez, Jorge M. Seminario, Seoung-Bum Son, Se-Hee Lee, Steven M. George, Chunmei Ban, and Perla B. Balbuena, “Structure and Reactivity of Alucone-Coated Films on Si and Li_xSi_y Surfaces”, ACS Appl. Mater. Interfaces 7, 11948-11955 (2015).

402.     Younghee Lee, Jaime W. DuMont, Andrew S. Cavanagh, and Steven M. George, “Atomic Layer Deposition of AlF₃ Using Trimethylaluminum and Hydrogen Fluoride”, J. Phys. Chem. C. 119, 14185-14194 (2015).

401.     Matthias J. Young, Charles B. Musgrave, and Steven M. George, “Growth and Characterization of Al₂O₃ Atomic Layer Deposition Films on sp²-Graphitic Carbon Substrates Using NO₂/Trimethylaluminum Pretreatment”, ACS Appl. Mater. Interfaces 7, 12030-12037 (2015).

400.     Younghee Lee, Jaime W. DuMont and Steven M. George, “Mechanism of Thermal Al₂O₃ Atomic Layer Etching Using Sequential Reactions with Sn(acac)₂ and HF” Chem. Mater. 27, 3648-3657 (2015).

399.     Younghee Lee, Jaime W. DuMont and Steven M. George, “Atomic Layer Etching of HfO₂ Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)₂ and HF”, ECS J. Solid State Sci. Technol. 4, N5013-N5022 (2015).

398.     Younghee Lee and Steven M. George, “Atomic Layer Etching of Al₂O₃ Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)₂ and HF”, ACS Nano 9, 2061-2070 (2015).

397.     Jaime W. DuMont and Steven M. George, “Pyrolysis of Alucone Molecular Layer Deposition Films Using In Situ Transmission Fourier Transform Infrared Spectroscopy”, J. Phys. Chem. C. 119, 14603-14612 (2015).

396.     Jae Ha Woo, Jonathan J. Travis, Steven M. George, and Se-Hee Lee, “Utilization of Al₂O₃ Atomic Layer Deposition for Li Ion Pathways in Solid State Li Batteries”, J. Electrochem. Soc. 162, A1-A6 (2015).

395.     Daniela Molina Piper, Seoung-Bum Son, Jonathan J Travis, Younghee Lee, Sang Sub Han, Seul Cham Kim, Kyu Hwan Oh, Steven M George, Se-Hee Lee, and Chunmei Ban, “Mitigating Irreversible Capacity Losses from Carbon Agents via Surface Modification”, J. Power Sources 275, 605-611 (2015). 

394.     Ming Xie, Daniela M. Piper, Miao Tian, Joel Clancey, Steven M. George, Sehee Lee and Yun Zhou, "Doped Si Nanoparticles with Conformal Carbon Coating and Cyclized-polyacrylonitrile Network as High-capacity and High-rate Lithium-ion Battery Anodes", Nanotechnology 26, 365401 (2015).

393.     J. W. Clancey, A. S. Cavanagh, R. S. Kukreja, A. Kongkanand and S. M. George, “Atomic Layer Deposition (ALD) of Ultrathin Platinum Films on Tungsten ALD Adhesion Layers: Application to High Surface Area Substrates”, J. Vac. Sci. Technol. A. 33, 01A130 (2015). 

392.     K. Sharma, R.A. Hall and S.M. George, “Spatial Atomic Layer Deposition on Flexible Substrates Using a Modular Rotating Cylinder Reactor”, J. Vac. Sci. Technol. A. 33, 01A132 (2015).

391.     Ming Xie, Xiang Sun,  Changgong Zhou,  Andrew S. Cavanagh,  Hongtao Sun,  Tao Hu, Gongkai Wang,  Jie Lian and Steven M. George, “Amorphous Ultrathin TiO₂ Atomic Layer Deposition Films on Carbon Nanotubes as Anodes for Lithium Ion Batteries”, J. Electrochem. Soc. 162, A974-A981 (2015). 

390.     Matthias J. Young, Aaron M. Holder, Steven M. George and Charles B. Musgrave, “Charge Storage in Cation Incorporated α-MnO₂”, Chem. Mater. 27, 1172-1180 (2015).

389.     Erika Biserni, Ming Xie, Rosaria Brescia, Alice Scarpellini; Mazdak Hashempour; Pooria Movahed; Steven M. George, Massimiliano Bestetti, Andrea Li Bassi, Paola Bruno, “Silicon Algae with Carbon Topping as Thin-film Anodes for Lithium-ion Microbatteries by a Two-step facile Method”, J. Power Sources 274, 252-259 (2015).

388.     Xiang Sun, Changgong Zhou, Ming Xie, Tao Hu, Hongtao Sun, Guoqing Xin, Gongkai Wang, Steven M. George and Jie Lian, “Amorphous Vanadium Oxide with Graphene by Atomic Layer Deposition for Stable High Energy Lithium Ion Anodes”, Chem. Commun. 50, 10703-10706 (2014). 

387.     Byoung H. Lee, Virginia R. Anderson, and Steven M. George, “Growth and Properties of Hafnicone and HfO₂/Hafnicone Nanolaminate and Alloy Films Using Molecular Layer Deposition Techniques”, ACS Appl. Mater. Interfaces 6, 16880-16887 (2014).

386.     Robert A. Hall, Steven M. George, Yeongae Kim, Woonbong Hwang, Meghan E. Sambert, Nancy A. Monteiro-Riviere, and Roger J. Narayan, “Growth of Zircone on Nanoporous Alumina Using Molecular Layer Deposition”, JOM 66 (4), 649-653 (2014).

385.     S.M. George, “Atomic Layer Deposition of Ultrathin and Continuous Metal Films”, in Proceedings of the 2014 IEEE International Interconnect Technology Conference/Advanced Metallization Conference (IITC/AMC), May 20-23, 2014, San Jose, California, pages 325-326.

384.     Daniel J. Higgs, Matthias J. Young, Jacob A. Bertrand and Steven M. George, “Oxidation Kinetics of Calcium Films by Water Vapor and Their Effect on Water Vapor Transmission Rate Measurements”, J. Phys. Chem. C. 118, 29322-29332 (2014).

383.     Joel Weber, Paul Blanchard, Aric Sanders, Jonas Gertsch, Steven George, Samuel Berweger, Atif Imtiaz, Kevin Coakley, Thomas Wallis, Kris Bertness, Pavel Kabos, Norman Sanford, Victor Bright, “GaN Nanowire Coated with Atomic Layer Deposition of Tungsten: A Probe for Near-Field Scanning Microwave Microscopy", Nanotechnology 25, 415502 (2014).

382.     Tao Hu, Ming Xie, Jing Zhong, Hong-tao Sun, Xiang Sun, Spencer Scott, Steven M. George, Chang-sheng Liu and Jie Lian, “Porous Fe₂O₃ Nanorods Anchored on Nitrogen-Doped Graphenes and Ultrathin Atomic Layer Deposition Coating for Long-Lived Lithium Ion Battery Anode”, Carbon 76, 141-147 (2014).

381.     Virginia R. Anderson, Noemi Leick, Joel W. Clancey, Katherine E. Hurst, Kim M. Jones, Anne C. Dillon and Steven M. George, “ Atomic Layer Deposition of Platinum Nanoparticles on Titanium Oxide and Tungsten Oxide Using Platinum(II) Hexafluoroacethylacetonate and Formalin as the Reactants”, J. Phys. Chem. C 118, 8960-8970 (2014).

380.     Nathan T. Eigenfeld, Jason M. Gray, Joseph J. Brown, George D. Skidmore, Steven M. George and Victor M. Bright, “Ultra-thin 3D Nano-Devices from Atomic Layer Deposition on Polyimide”, Adv. Mater. 26, 3962-3967 (2014).

379.     Jason M. Gray, John P. Houlton, Jonas C. Gertsch, Joseph J. Brown, Charles T. Rogers, Steven M. George and Victor M. Bright, “Hemispherical Micro-Resonators from Atomic Layer Deposition", J. Micromech. Microeng. 24, 125028 (2014).

378.     Yang He, Daniela Molina Piper, Meng Gu, Jonathan J. Travis, Steven M. George, Se-Hee Lee, Arda Genc, Lee Pullan, Jun Liu, Scott X. Mao Ji-Guang Zhang, Chunmei Ban and Chongmin Wang, "In Situ Transmission Electron Microscopy Probing of Native Oxide and Artificial Layer on Silicon Nanoparticles for Lithium Ion Battery", ACS Nano 8, 11816-11823 (2014).

377.     Xiang Sun, Changgong Zhou, Ming Xie, Hongtao Sun, Tao Hu, Fengyuan Lu, Spencer M. Scott, Steven M. George, Jie Lian, “Synthesis of ZnO Quantum Dots/Graphene Nanocomposites by Atomic Layer Deposition with High Lithium Storage Capacity”, J. Mater. Chem. A 2, 7319-7326 (2014).

376.     J.W. Kim, J.J. Travis, E.Y. Hu, K.W. Nam, S.C. Kim, C.S. Kang, J.H. Woo, X.Q. Yang, S.M. George, K.H. Oh, S.J. Cho and S.H. Lee, “Unexpected High Power Performance of Atomic Layer Deposition Coated Li[Ni_1/3Mn_1/3Co_1/3]O₂ Cathodes”,  J. Power Sources 254, 190-197 (2014). 

375.     Virginia R. Anderson, Andrew S. Cavanagh, Aziz I. Abdulagatov, Zachary M. Gibbs and Steven M. George, “Waterless TiO₂ Atomic Layer Deposition Using Titanium Tetrachloride and Titanium Tetraisopropoxide”,  J. Vac. Sci. Technol. A. 32, 01A114-1 (2014).

374.     D.M. Piper, J.J. Travis, M.J. Young, S.B. Son, S.C. Kim, K.H. Oh, S.M. George, C.M. Ban and S.H. Lee, “Reversible High-Capacity Si Nanocomposite Anodes for Lithium Ion Batteries Enabled by Molecular Layer Deposition”, Adv. Mater. 26, 1596-1601 (2014). 

373.     S.H. Woo, H. W. Lim, S.B. Jeon, J.J. Travis, S.M. George, S.H. Lee, Y.N. Jo, J.H. Song, Y.S. Jung, S.Y Hong, N.S. Choi and K.T. Lee, “Ion-Exchangeable Functional Binders and Separator for High Temperature Performance of Li_1.1Mn_1.86Mg_0.04O₄ Spinel Electrodes in Lithium Ion Batteries”, J. Electrochem. Soc. 160, A2234-A2243 (2013). 

372.     Jun Liu, Byunghoon Yoon, Eli Kuhlmann, Miao Tian, Jie Zhu, Steven M. George, Yung-Cheng Lee and Ronggui Yang, “Ultra-Low Thermal Conductivity of Atomic/Molecular Layer-Deposited Hybrid Organic-Inorganic Zincone Thin Films”, Nano Lett. 13, 5594-5599 (2013).

371.     A.S. Cavanagh, L. Baker, J.W. Clancey, J. Yin, A. Kongkanand. F.T. Wagner and S.M. George, “In Situ Characterization of Plasma-Assisted Pt ALD on W ALD Adhesion Layers with Spectroscopic Ellipsometry”, ECS Transactions 58(10), 19-26 (2013).

370.     Dali Shao, Xiang Sun, Ming Xie, Mingpeng Yu, Steven M. George, Jie Lian and Shayla Sawyer, “ZnO Quantum Dots-Graphene Composite for Efficient Ultraviolet Sensing”, Mater. Lett. 112, 165-168 (2013).

369.     Daniel J. Higgs, Matthias J. Young, Jacob A. Bertrand, and Steven M. George, “New Calcium Test to Determine Water Vapor Transmission Rates Based on Quartz Crystal Microbalance Measurements”, 56^th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Providence, RI, April 20-25, 2013, pages 446-450.

368.     Xiang Sun, Ming Xie, Jonathan J. Travis, Gongkai Wang, Hongtao Sun, Jie Lian and Steven M. George^, “Pseudocapacitance of Amorphous TiO₂ Thin Films Anchored to Graphene and Carbon Nanotubes using Atomic Layer Deposition”, J. Phys. Chem. C. 117, 22497-22508 (2013). 

367.     Xianming Dai, Mehdi Famouri, Aziz I. Abdulagatov, Ronggui Yang, Yung-Cheng Lee, Steven M. George and Chen Li, “Capillary Evaporation on Micromembrane-Enhanced Microchannel Wicks with Atomic Layer Deposited Silica”, Appl. Phys. Lett. 103, 151602 (2013).

366.     Aziz I. Abdulagatov, Kalvis E. Terauds, Jonathan J. Travis, Andrew S. Cavanagh, Rishi Raj and Steven M. George, “Pyrolysis of Titanicone Molecular Layer Deposition Films as Precursors for Conducting TiO₂/Carbon Composite Films”, J. Phys. Chem. C. 117, 17442-17450 (2013).

365.     J.A. Bertrand, D.J. Higgs, M.J. Young and S.M. George, “H₂O Transmission Rate Through Polyethylene Naphthalate Polymer Using the Electrical Ca Test”, J. Phys. Chem. A 117, 12026-12034 (2013). 

364.     J.J. Brown, R.A. Hall, P.E. Kladitis, S.M. George and V.M. Bright, “Molecular Layer Deposition on Carbon Nanotubes”, ACS Nano 7, 7812-7823 (2013).

363.     G.N. Parsons, J.W. Elam, S.M. George, S. Haukka, H. Jeon, W.M.M. Kessels, M. Leskelä, P. Poodt, M. Ritala and S.M. Rossnagel, “History of Atomic Layer Deposition and its Relationship with the American Vacuum Society”, J. Vac. Soc. Technol. A 31, 050818 (2013).

362.     Prakash Periasamy, Harvey L. Guthrey, Aziz I. Abdulagatov, Paul F Ndione, Joseph J. Berry, David S. Ginley, Steven M. George, Philip A. Parilla and Ryan P. O’Hayre, “Metal-Insulator-Metal Diodes:  Role of the Insulator Layer on the Rectification Performance”, Adv. Mater. 25, 1301-1308 (2013).

361.     Chunmei Ban, Ming Xie, Xiang Sun, Jonathan J. Travis, Gongkai Wang, Hongtao Sun, Anne C. Dillon, Jie Lian and Steven M. George, “Atomic Layer Deposition of Amorphous TiO₂ on an Al₂O₃ Adhesion Layer on Graphene as an Anode for Li Ion Batteries”, Nanotechnology 24, 424002 (2013).

360.     Byoung H. Lee, Virginia R. Anderson and Steven M. George, “Molecular Layer Deposition of Zircone and ZrO₂/Zircone Alloy Films:  Growth & Properties”, Chem. Vapor Deposition 19, 204-212 (2013).

359.     Yoon Seok Jung, Peng Lu, Andrew S. Cavanagh, Chunmei Ban, Gi-Heon Kim, Se-Hee Lee, Steven M. George, Stephen J. Harris and Anne C. Dillon, “Unexpected Improved Performance of ALD Coated LiCoO₂/Graphite Li-ion Batteries”, Adv. Energy Mater. 3, 213-219 (2013).

358.     Shih-Hui Jen, Steven M. George, Robert S. McLean and Peter F. Carcia, “Alucone Interlayers to Minimize Stress Caused by Thermal Expansion Mismatch between Al₂O₃ Films and Teflon Substrates”, ACS Appl. Mater. Interfaces 5, 1165-1173 (2013).

357.     J.A. Bertrand and S.M. George, “Evaluating Al₂O₃ Gas Diffusion Barriers Grown Directly on Ca Films Using Atomic Layer Deposition Techniques”, J. Vac. Sci. Technol. A 31, 01A122 (2013).

356.     B.H. Lee, B.Yoon, A.I. Abdulagatov, R.A. Hall and S.M. George, “Growth and Properties of Hybrid Organic-Inorganic Metalcone Films Using Molecular Layer Deposition Techniques”, Invited Feature Article, Adv. Funct. Mater. 23, 532-546 (2013). 

355.     W.K. Warburton, Wolfgang Hennig, Jacob A. Bertrand, Steven M. George and Steven Biegalski, “Atomic Layer Deposition a-Al₂O₃ Diffusion Barriers to Eliminate the Memory Effect in Beta-gamma Radioxenon Detectors”, J. Radioanal. Nucl. Chem. 296, 541-549 (2013).

354.     L. Baker, A.S. Cavanagh, J. Yin, S.M. George, A. Kongkanand and F.T. Wagner, "Growth of Continuous and Ultrathin Platinum Films on Tungsten Adhesion Layers Using Atomic Layer Deposition Techniques", Appl. Phys. Lett. 101, 111601 (2012).

353.     Byunghoon Yoon, Byoung H. Lee and Steven M. George, “Highly Conductive and Transparent Hybrid Organic-Inorganic Zincone Thin Films Using Atomic and Molecular Layer Deposition”, J. Phys. Chem.C 116, 24784-24791 (2012).

352.     J.A. Bertrand D.J. Higgs and S.M. George, CVD-Ca Test, “Water Vapor Transmission Rates for Ultrabarriers on Polymers Grown Using Atomic Layer Deposition:  Polymer Effects”, 55^th Annual Technical Conference Proceedings, Society of Vacuum Coaters (SVC), 2012. 

351.     S.M. George, B.H. Lee, B. Yoon, A.I. Abdulagatov and R.A. Hall, “Metalcones:  Hybrid Organic-Inorganic Films Fabricated Using Atomic and Molecular Layer Deposition Techniques”, 55^th Annual Technical Conference Proceedings, Society of Vacuum Coaters (SVC), 2012. 

350.     Y.S. Jung, A.S. Cavanagh, L. Gedvilas, N.E. Widjonarko, I.D. Scott, S.H. Lee, G.H. Kim, S.M. George and A.C. Dillon, “Improved Functionality of Lithium-Ion Batteries Enabled by Atomic Layer Deposition on the Porous Microstructure of Polymer Separators and Coating Electrodes”, Adv. Energy Mater. 2, 1022-1027 (2012). 

349.     P.T. Blanchard, K.A. Bertness, T.E. Harvey, A.W. Sanders, N.A. Sanford, S.M. George, D. Seghete, “MOSFETs Made from GaN Nanowires with Fully Conformal Cylindrical Gates”, IEEE Trans. Nanotechnology 11, 479-482 (2012).

348.     Jae Ha Woo, James E. Trevey, Andrew S. Cavanagh, Yong Seok Choi, Seul Cham Kim, Steven M. George, Kyu-Hwan Oh, and Se-Hee Lee, “Nanoscale Interface Modification of LiCoO₂ by Al₂O₃ Atomic Layer Deposition for Solid-State Li Batteries, J. Electrochem. Soc. 159, A1120-A1124 (2012).

347.     Shih-Hui Jen, Byoung H. Lee, Steven M. George, Robert S. McLean and Peter F. Carcia, “Critical Tensile Strain and Water Vapor Transmission Rate for Alloy Films Grown Using Al₂O₃ Atomic Layer Deposition and Alucone Molecular Layer Deposition”, Appl. Phys. Lett. 101, 234103 (2012).

346.     A.I. Abdulagatov, R.A. Hall, J.L. Sutherland_, B.H. Lee, A.S. Cavanagh and S.M. George, “Molecular Layer Deposition of Titanicone Films using TiCl₄ and Ethylene Glycol or Glycerol:  Growth and Properties”, Chem. Mater. 24, 2854-2863 (2012).

345.     W. Wang, M. Tian, A.I. Abdulagatov, S.M. George, Y.C. Lee and R.G. Yang, “Three-Dimensional Ni/TiO₂ Nanowire Network for High Areal Capacity Lithium-Ion Microbattery Applications”, Nano Letters 12, 655-660 (2012).

344.     S.M. George, B. Yoon, R.A. Hall, A.I. Abdulagatov, Z.M. Gibbs, Y. Lee, D. Seghete and B.H. Lee, "Molecular Layer Deposition of Hybrid Organic-Inorganic Films", Chapter 5 in Atomic Layer Deposition of Nanostructured Materials, edited by N. Pinna and M Knez (Wiley-VCH, Weinheim, Germany, 2012).

343.     Xiang Sun, Ming Xie, Gongkai Wang, Hongtao Sun, Andrew S. Cavanagh, Jonathan J. Travis, Steven George and Jie Lian, “Atomic Layer Deposition of TiO₂ on Graphene for Supercapacitors”, J. Electrochem. Soc. 159, A364-A369 (2012).  

342.     Paul Poodt, David C. Cameron, Eric Dickey, Steven M. George, Vladimir Kuznetsov, Gregory N. Parsons, Fred Roozeboom, Ganesh Sundaram and Ad Vermeer, “Spatial Atomic Layer Deposition: A RouteTowards Further Industrialization of ALD” J. Vac. Sci. Technol. A 30, 010802 (2012).

341.     P. Ryan Fitzpatrick, Zachary M. Gibbs and Steven M. George, “Evaluating Operating Conditions for Continuous Atmospheric Atomic Layer Deposition using a Multiple Slit Gas Source Head”, J. Vac. Sci. Technol. A 30, 01A136 (2012).

340.     Byoung H. Lee, Byunghoon Yoon, Virginia R. Anderson and Steven M. George, “Alucone Alloys with Tunable Properties Using Alucone Molecular Layer Deposition and Al₂O₃ Atomic Layer Deposition”, J. Phys. Chem. C. 116, 3250-3257 (2012).

339.     L. Wang, J.J. Travis, A.S. Cavanagh, X. Liu, S.P. Koenig, P.Y. Huang, S.M. George and J.S. Bunch, “Ultrathin Oxide Films by Atomic Layer Deposition on Graphene”, Nano Letters 12, 3706-3710 (2012). 

338.     Y. Zhang, D. Seghete, A.I. Abdulagatov, Z.M. Gibbs, A.S. Cavanagh, R. Yang, S.M. George and Y.C. Lee, “Investigation of the Defect Density in Ultra-Thin Al₂O₃ Films Grown using Atomic Layer Deposition”, Surf. Coat. Tech. 205, 3334-3339 (2011).  

337.     Yoon Seok Jung, Andrew S. Cavanagh, Yanfa Yan, Steven M. George and Arumugam Manthiram, “Effects of Atomic Layer Deposition of Al₂O₃ on the Li[Li_0.20Mn_0.54Ni_0.13Co_0.13]O₂ Cathode of Lithium-Ion Batteries”, J. Electrochem. Soc. 158, A1298-A1302 (2011).

336.     A.I. Abdulagatov, Y. Yan, J.R Cooper, Y. Zhang, Z.M. Gibbs, A.S. Cavanagh, R.G. Yang, Y.C. Lee and S.M. George, “Al₂O₃ and TiO₂ Atomic Layer Deposition on Copper for Water Corrosion Resistance”, ACS Appl. Mater. Interfaces 3, 4593-4601 (2011).

335.     Y. Zhang, R.G. Yang, S.M. George and Y.C. Lee, “In-Situ Inspection of Cracking in Atomic-Layer-Deposited Barrier Films on Surface and in Buried Structures”, Thin Solid Films 520, 251-257 (2011). 

334.     B. H. Lee, V. R. Anderson and S. M. George, “Metalcone and Metalcone/Metal Oxide Alloys Grown Using Atomic & Molecular Layer Deposition”, ECS Transactions 41 (2) 131-138 (2011). 

333.     B. Yoon, B. H. Lee  and S. M. George, “Molecular Layer Deposition of Flexible, Transparent and Conductive Hybrid Organic-Inorganic Thin Films”, ECS Transactions 41 (2) 271-277 (2011). 

332.     Gregory N. Parsons, Steven M. George and Mato Knez, “Progress and Future Directions for Atomic Layer Deposition and ALD-based Chemistry”, MRS Bulletin 36, 865-871 (2011).

331.     Y. Lee, B. Yoon, A.S. Cavanagh and S.M. George, “Molecular Layer Deposition of Aluminum Alkoxide Polymer Films Using Trimethylaluminum and Glycidol”, Langmuir 27, 15155-15164 (2011).

330.     S.M. George, B.H. Lee, B. Yoon, A.I. Abdulagatov and R.A. Hall, “Metalcones: Hybrid Organic-Inorganic Films Fabricated Using Atomic & Molecular Layer Deposition Techniques”, J. Nanoscience & Nanotechnology 11, 7948-7955 (2011). 

329.     S.M. George, P.R. Fitzpatrick and Z.M. Gibbs, “Atomic Layer Deposition for Continuous Roll-to-Roll Processing”, Summer Bulletin of the Society of Vacuum Coaters (SVC), pages 50-54 (2011).

328.     S.M. George, P.R. Fitzpatrick and Z.M. Gibbs, “Atomic Layer Deposition for Continuous Roll-to-Roll Processing”, 54th Technical Conference Proceedings of the Society of Vacuum Coaters (SVC), 76-81 (2011).

327.     J.A. Bertrand and S.M. George, “Atomic Layer Deposition on Polymers for Ultralow Water Vapor Transmission Rates:  The Ca Test”, 54th Technical Conference Proceedings of the Society of Vacuum Coaters (SVC), 492-496 (2011).

326.     B.D. Davidson, D. Seghete, S.M. George and V.M. Bright, “ALD Tungsten NEMS Switches and Tunneling Devices”, Sensors & Actuators A 166, 269-276 (2011).

325.     L.A. Riley, S.V. Atta, A.S. Cavanagh, Y. Yan, S.M. George, P. Liu, A.C. Dillon and S.H. Lee, “Electrochemical Effects of ALD Surface Modification on Combustion Synthesized LiNi_1/3Mn_1/3Co_1/3O₂ as a Layered Cathode Material”, J. Power Sources 196, 3317-3324 (2011).

324.     S.M. George, “Hybrid Organic-Inorganic Films Grown Using Molecular Layer Deposition”, The Strem Chemiker, Vol. XXV, No. 1, March 2011 (Strem Chemicals, Inc., Newburyport, Massachusetts) pp. 13-26.

323.     E. Kang, Y.S. Jung, A.S. Cavanagh, G.H. Kim, S.M. George, A.C. Dillon, J.K. Kim and J. Lee, “Fe₃O₄ Nanoparticles Confined in Mesocellular Carbon Foam for High Performance Anode Materials for Lithium-Ion Batteries”, Adv. Funct. Mater. 21, 2430-2438 (2011).

322.     A.C. Dillon, L.A. Riley, Y.S. Jung, C. Ban, D. Molina, A.H. Mahan, A.S. Cavanagh, S.M. George and S.-H. Lee, “HWCVD MoO₃ Nanoparticles and a-Si for Next Generation Li-Ion Anodes”, Thin Solid Films 519, 4495-4497 (2011).

321.     K. Leung, Y. Qi, K.R. Zavadil, Y.S. Jung, A.C. Dillon, A.S. Cavanagh; S.H. Lee, S.M. George, “Using Atomic Layer Deposition to Hinder Solvent Decomposition in Lithium Ion Batteries: First Principles Modeling and Experimental Studies”, J. Am. Chem. Soc. 133, 14741-14754 (2011).

320.     S.H. Jen, J.A. Bertrand and S.M. George, “Critical Tensile and Compressive Strains for Cracking of Al₂O₃ Films Grown by Atomic Layer Deposition”, J. Appl. Phys. 109, 084305 (2011).

319.     L. Baker, A.S. Cavanagh, D. Seghete, S.M. George, A.J.M. Mackus, W.M.M. Kessels, Z.Y. Liu and F.T. Wagner, “Nucleation and Growth of Pt Atomic Layer Deposition on Al₂O₃ Substrates Using (Methylcyclopentadienyl)-Trimethyl Platinum and O₂ Plasma”, J. Appl. Phys. 109, 084333 (2011).

318.     B. Yoon, Y. Lee, A. Derk, C.B. Musgrave and S.M. George, “Molecular Layer Deposition of Conductive Hybrid Organic-Inorganic Thin Films Using Diethylzinc and Hydroquinone”, ECS Transactions 33 (27) 191-195 (2011).

317.     D.N. Goldstein and S.M. George, "Surface Poisoning in the Nucleation and Growth of Palladium Atomic Layer Deposition with Pd(hfac)₂ and Formalin", Thin Solid Films 519, 5339-5347 (2011).

316.     D. Seghete, F.H. Fabreguette and S.M. George, “Using a Slit Doser to Probe Gas Dynamics during Al₂O₃ Atomic Layer Deposition and to Fabricate Laterally Graded Al₂O₃ Layers”, Thin Solid Films 519, 3612-3618 (2011).

315.     D. Seghete, G.B. Rayner, Jr., A.S. Cavanagh, V.R. Anderson and S.M. George, "Molybdenum Atomic Layer Deposition Using MoF₆ and Si₂H₆ as Reactants”, Chem. Mater. 23, 1668-1678 (2011).

314.     L.A. Riley, A.S. Cavanagh, S.M. George, S.H. Lee and A.C. Dillon, “Improved Mechanical Integrity of ALD-Coated Composite Electrodes for Li-Ion Batteries”, Electrochem. Solid-State Lett. 14, A29-A31 (2011).

313.     I.D. Scott, Y.S. Jung, A.S. Cavanagh, Y. Yan, A.C. Dillon, S.M. George, S.H. Lee, “Ultrathin Coatings on Nano-LiCoO₂ for Li-Ion Vehicular Applications”, Nano Letters 11, 414-418 (2011). 

312.     J.R. Montague, M. Dalberth, J.M. Grey, D. Seghete, K.A. Bertness, S.M. George, V.M. Bright, C.T. Rogers, N.A. Sanford, “Analysis of High-Q Gallium Nitride Resonators in Response to Deposited Thin Films”, Sensors and Actuators A 165, 59-65 (2011).

311.     J.H. Cheng, D. Seghete, M. Lee, J.B. Schlager, K.A. Bertness, N.A. Sanford, R. Yang, S.M. George and Y.C. Lee, “Atomic layer deposition enabled interconnect technology for vertical nanowire arrays” Sensors and Actuators A 165, 107-114 (2011).

310.     D.C. Miller, R.R. Foster, S.H. Jen, J.A. Bertrand, S.J. Cunningham, A.S. Morris, Y.C. Lee, S.M. George and M.L. Dunn, “Thermo-mechanical Properties of Alumina Films Created Using the Atomic Layer Deposition Technique”, Sensors and Actuators A 164, 58-67 (2010).

309.     L.A. Riley, A.S. Cavanagh, S.M. George, Y.S. Jung, Y. Yan, S.H. Lee and A.C. Dillon, “Conformal Surface Coatings to Enable High Volume Expansion Li-ion Anode Materials”, ChemPhysChem. 11, 2124-2130 (2010).

308.     J.Y. Kim and S.M. George, “Tin Monosulfide Thin Films Grown by Atomic Layer Deposition Using Tin 2,4-Pentanedionate and Hydrogen Sulfide, J. Phys. Chem. C 114, 17597-17603 (2010).

307.     S.K. Sarkar, J.Y. Kim, D.N. Goldstein, N.R. Neale, K. Zhu, C.M. Elliott, A.J. Frank and S.M. George, "In₂S₃ Atomic Layer Deposition and Its Application as a Sensitizer on TiO₂ Nanotube Arrays for Solar Energy Conversion", J. Phys. Chem. C 114, 8032-8039 (2010). 

306.       T.K. Minton, B. Wu, J. Zhang, N.F. Lindholm, A.I. Abdulagatov, J.L. O’Patchen, S.M. George and M.D. Groner, “Protecting Polymers in Space with Atomic Layer Deposition Coatings”, ACS Appl. Mater. Interfaces 2, 2515-2520 (2010).

305.     D.J. Guo, A.I. Abdulagatov, D.M. Rourke, K.A. Bertness, S.M. George, Y.C. Lee and W. Tan, “GaN Nanowire Functionalized with Atomic Layer Deposition Techniques for Enhanced Immobilization of Biomolecules”, Langmuir 26, 18382-18391 (2010).

304.     A.S. Cavanagh, Y. Lee, B. Yoon and S.M. George, "Atomic Layer Deposition of LiOH and Li₂CO₃ Using Lithium t-butoxide as the Lithium Source", in Atomic Layer Deposition Applications 6, edited by A. Londergan, J.W. Elam, O. van der Straten, S. De Gendt, S.F. Bent and S.B. Kang (The Electrochemical Society, Pennington, NJ, 2010); also ECS Transactions, 33 (2), 223-229 (2010). 

303.     N.A. Sanford, P.T. Blanchard, K.A. Bertness, L. Mansfield, J.B. Schlager, A.W. Sanders, A. Roshko, B.B. Burton and S.M. George, "Steady-State and Transient Photoconductivity in c-axis GaN Nanowires Grown by Nitrogen-Plasma-Assisted Molecular Beam Epitaxy", J. Appl. Phys. 107, 034318 (2010).

302.     D. Seghete, R.A. Hall, B. Yoon and S.M. George, "Importance of Trimethylaluminum Diffusion in Three-Step ABC Molecular Layer Deposition Using Trimethylaluminum, Ethanolamine and Maleic Anhydride”, Langmuir 26, 19045-19051 (2010).

301.     Y.S. Jung, A.S. Cavanagh, A.C. Dillon, M.D. Groner, S.M. George and S.H. Lee, "Ultrathin Direct Atomic Layer Deposition on Composite Electrodes is Critical for Highly Durable and Safe Li-Ion Batteries ", Adv. Mater. 22, 2172-2176 (2010).

300.     S.M. George, "Atomic Layer Deposition:  An Overview", Chem. Rev. 110, 111-131 (2010).

299.     Y.S. Jung, A.S. Cavanagh, A.C. Dillon, M.D. Groner, S.M. George and S.H. Lee, "Enhanced Stability of LiCoO₂ Cathodes in Lithium-ion Batteries Using Surface Modification by Atomic Layer Deposition", J. Electrochem. Soc. 157, A75-A81 (2010). 

298.     R.A. Wind and S.M. George, "Quartz Crystal Microbalance Studies of Al₂O₃ Atomic Layer Deposition Using Trimethylaluminum and Water at 125°C", J. Phys. Chem. A 114, 1281-1289 (2010).

297.     D.C. Miller, R.R. Foster, S.H. Jen, J.A. Bertrand, D. Seghete, B. Yoon, Y.C. Lee, S.M. George and M.L. Dunn, "Thermo-Mechanical Properties of Aluminum Alkoxide (Alucone) Films Created Using Molecular Layer Deposition", Acta Mater. 57, 5083-5092 (2009).

296.     D.C. Miller, R.R. Foster, Y. Zhang, S.H. Jen, J.A. Bertrand, Z. Lu, D. Seghete, J.L. O'Patchen, R. Yang, Y.C. Lee, S.M. George and M.L. Dunn, "The Mechanical Robustness of Atomic Layer- and Molecular Layer-Deposited Coatings on Polymer Substrates", J. Appl. Phys. 105, 093527 (2009).

295.     D.N. Goldstein and S.M. George, "Enhancing the Nucleation of Palladium Atomic Layer Deposition Using Trimethylaluminum to Prevent Surface Poisoning by Reaction Products", Appl. Phys. Lett. 95, 143106 (2009).

294.     G.B. Rayner, Jr. and S.M. George, "Nucleation and Growth of Tantalum Nitride Atomic Layer Deposition on Al₂O₃ Using TBTDET and Hydrogen Radicals", J. Vac. Sci. Technol. A 27, 716-724 (2009).

293.     Y.J. Chang, J.M. Gray, A. Imtiaz, D. Seghete, T.M. Wallis, S.M. George, P. Kabos, C.T. Rodgers and V.M. Bright, "Micromachined Resonators of High Q-Factor Based on Atomic Layer Deposited Alumina", Sens. Actuators A 154, 229-237 (2009).

292.     B. Yoon, J.L. O'Patchen, D. Seghete, A.S. Cavanagh and S.M. George, "Molecular Layer Deposition of Hybrid Organic-Inorganic Polymer Films Using Diethylzinc and Ethylene Glycol", Chem. Vap. Deposition 15, 112-121 (2009).

291.     R.A. Wind, F.H. Fabreguette, Z.A. Sechrist and S.M. George, "Nucleation Period, Surface Roughness and Oscillations in Mass Gain per Cycle during W Atomic Layer Deposition on Al₂O₃", J. Appl. Phys. 105, 074309 (2009).

290.     S.M. George, B. Yoon and A.A. Dameron, "Surface Chemistry for Molecular Layer Deposition of Organic and Hybrid Organic-Inorganic Polymers", Acc. Chem. Res. 42, 498-508 (2009).

289.     B. Yoon, D. Seghete, A.S. Cavanagh and S.M. George, "Molecular Layer Deposition of Hybrid Organic-Inorganic Alucone Polymer Films Using a Three-Step ABC Reaction Sequence", Chem. Mater. 21, 5365-5374 (2009).

288.     Y. Zhang, Y.Z. Zhang, D.C. Miller, J.A. Bertrand, S.H. Jen, R. Yang, M.L. Dunn, S.M. George and Y. C. Lee, "Fluorescent Tags to Visualize Defects in Al₂O₃ Thin Films Grown Using Atomic Layer Deposition", Thin Solid Films 517, 6794-6797 (2009).

287.     Y. Zhang, J.A. Bertrand, R. Yang, S.M. George and Y. C. Lee, "Electroplating to Visualize Defects in Al₂O₃ Thin Films Grown Using Atomic Layer Deposition", Thin Solid Films 517, 3269-3272 (2009).

286.     P. F. Carcia, R.S. McLean, M. D. Groner, A. A. Dameron and S. M. George, Al₂O₃ ALD and SiN PECVD Films as Gas Diffusion Ultra-barrier on Polymer Substrates, J. Appl. Phys. 106, 023533 (2009).

285.     B.B. Burton, F.H. Fabreguette and S.M. George, "Atomic Layer Deposition of MnO Using Bis(ethylcyclopentadienyl)manganese and H₂O", Thin Solid Films 517, 5658-5665 (2009).

284.     B. B. Burton, S. W. Kang, S.W. Rhee and S.M. George, "SiO₂ Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in situ Transmission FTIR Spectroscopy", J. Phys. Chem. C 113, 8249-8257 (2009).

283.     A.S. Cavanagh, C.A. Wilson, A.W. Weimer and S.M. George, "Atomic Layer Deposition on Gram Quantities of Multiwalled Carbon Nanotubes", Nanotechnology 20, 255602 (2009).

282.     J.R. Scheffe, A. Francés, D.M. King, X. Liang, B.A. Branch, A.S. Cavanagh, S.M. George and A.W. Weimer, "Atomic layer deposition of iron(III) oxide on zirconia nanoparticles in a fluidized bed reactor using ferrocene and oxygen", Thin Solid Films 517, 1874–1879 (2009).

281.     D. Seghete, B.D. Davidson, R.A. Hall, Y.J. Chang, V.M. Bright and S.M. George, "Sacrificial Layers for Air Gaps in NEMS Using Alucone Molecular Layer Deposition", Sens. Actuators A  155, 8-15 (2009).

280.     B.B. Burton, D.N. Goldstein and S.M. George, "Atomic Layer Deposition of MgO Using Bis(ethylcyclopentadienyl)magnesium and H₂O", J. Phys. Chem. C 113, 1939-1946 (2009).

279.     X. Liang, P. Li, S.M. George and A.W. Weimer, "Nanocoating Hybrid Polymer Films on Large Quantities of Cohesive Nanoparticles by Molecular Layer Deposition", AIChE J. 55, 1030-1039 (2009).

278.     D.N. Goldstein, J.A. McCormick and S.M. George, "Al₂O₃ Atomic Layer Deposition using Trimethylaluminum and Ozone Studied by in situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry", J. Phys. Chem. C 112, 19530-19539 (2008).

277.     N.F. Lindholm, J. Zhang, T.K. Minton, J.L. O’Patchen, S.M. George and M.D. Groner, "Protection of Polymers from the Space Environment by Atomic Layer Deposition", Proceedings of the 9^th International Conference on the Protection of Materials in a Space Environment, Toronto, Canada, May 20-23, 2008.

276.     B.B. Burton, M.P. Boleslawski, A.T. Desombre and S.M. George, "Rapid SiO₂ Atomic Layer Deposition Using Tris(tert-pentoxy)silanol", Chem. Mater. 20, 7031-7043 (2008).

275.     S.M. George and B. Yoon, "Molecular Layer Deposition of Organic and Hybrid Organic-Inorganic Polymers", In Material Matters, Vol. 3, No. 2, "Nanoscale Surface Modification" (Aldrich Chemical Co., Inc., Milwaukee, WI, 2008) pp. 34-37.

274.     X. Du and S.M. George, "Thickness Dependence of Sensor Response for CO Gas Sensing by Tin Oxide Films Grown Using Atomic Layer Deposition", Sensors and Actuators B 135, 152-160 (2008).

273.     X. Du, Y. Du and S.M. George, "CO Gas Sensing by Ultrathin Tin Oxide Films Grown by Atomic Layer Deposition Using Transmission FTIR Spectroscopy", J. Phys. Chem. A 112, 9211-9219 (2008).

272.     A.A. Dameron, D. Seghete, B.B. Burton, S.D. Davidson, A.S. Cavanagh, J.A. Bertrand and S.M. George, "Molecular Layer Deposition of Alucone Polymer Films Using Trimethylaluminum and Ethylene Glycol", Chem. Mater. 20, 3315-3326 (2008).

271.     X. Liang, D.M. King, M.D. Groner, J.H. Blackson, J.D. Harris, S.M. George and A.W. Weimer, "Barrier Properties of Polymer/Alumina Nanocomposite Membranes Fabricated by Atomic Layer Deposition", J. Membrane Sci. 322, 105-112 (2008).

270.     B.B. Burton, A.R. Lavoie and S.M. George, "Tantalum Nitride Atomic Layer Deposition Using Tris(diethylamido)(tert-butylimido)tantalum and Hydrazine", J. Electrochem. Soc. 155, D508-D516 (2008).

269.     A.A. Dameron, S.D. Davidson, B.B. Burton, P.F. Carcia, R.S. McLean and S.M. George, "Gas Diffusion Barriers on Polymers Using Multilayers Fabricated by Al₂O₃ and Rapid SiO₂ Atomic Layer Deposition", J. Phys. Chem. C 112, 4573-4580 (2008).

268.     N.M. Adamczyk, A.A. Dameron and S.M. George, "Molecular Layer Deposition of Poly(p-phenylene terephthalamide) Films Using Terephthaloyl Chloride and p-Phenylenediamine", Langmuir 24, 2081-2089 (2008).

267.     C.A. Wilson, D.N. Goldstein, J.A. McCormick, A.W. Weimer and S.M. George, "Tungsten Atomic Layer Deposition on Cobalt Nanoparticles", J. Vac. Sci. Technol. A 26, 430-437 (2008).

266.     L.L. Liu, O.M. Mukdadi, M.K. Tripp, C.F. Herrmann, J.R. Hertzberg, S. M. George,  V.M. Bright and R. Shandas,  "Atomic Layer Deposition for Fabricating Capacitive Micromachined Ultrasonic Transducers: Initial Characterization", Sensors and Materials 20, 15-34 (2008).

265.     C.A. Wilson, J.A. McCormick, A.S. Cavanagh, D.N. Goldstein, A.W. Weimer and S.M. George, "Tungsten Atomic Layer Deposition on Polymers", Thin Solid Films 516, 6175-6185 (2008).

264.     M.A. Weimer, M.D. Groner, L.F. Hakim, D.M. King, X. Liang, P. Li, S.M. George and A.W. Weimer, "Ultrafast Metal-Insulator Varistors Based Tunable Al₂O₃ Tunnel Junctions", Appl. Phys. Lett. 92, 164101 (2008).

263.     X. Liang, G.D. Zhan, D.M. King, J.A. McCormick, J. Zhang, S.M. George and A.W. Weimer, "Alumina Atomic Layer Deposition Nanocoatings on Primary Diamond Particles in a Fluidized Bed Reactor", Diam. Relat. Mater. 17, 185-189 (2008). 

262.     D.S. Finch, T. Oreskovic, K. Ramadurai, C.F. Herrmann, S.M. George and R.L. Mahajan, "Biocompatibility of Atomic Layer-Deposited Alumina Thin Films", J. Biomed. Mater. Res. A  87A, 100-106 (2008).

261.     R. Cooper, H.P. Upadhyaya, T.K. Minton, M.R. Berman, X. Du and S.M. George, "Protection of Polymer from Atomic-Oxygen Erosion Using Al₂O₃ Atomic Layer Deposition Coatings", Thin Solid Films 516, 4036-4039 (2008).

260.     A.S. Cavanagh, C.A. Wilson, A.W. Weimer and S.M. George, "Atomic Layer Deposition on Quantities of Multiwalled Carbon Nanotubes", in Synthesis and Surface Engineering of Three-Dimensional Nanostructures, edited by Ruth Hourbertz (Mater. Res. Soc. Symp. Proc. Volume 1054E, Warrendale, PA, 2008), Paper #1054-FF03-10. 

259.     P.F. Carcia, R.S. McLean, M.D. Groner, A.A. Dameron and S.M. George, "Application of Atomic Layer Deposition for Gas Permeation Barrier Thin Films", Electrochemistry Society (ECS) Transactions 11(7), 15-21 (2007) in Atomic Layer Deposition Applications 3, edited by A. Londergan, J.W. Elam, O. van der Straten, S. De Gendt, S.F. Bent and S.B. Kang (The Electrochemical Society, Pennington, NJ, 2007).

258.     S.M. George, A.A. Dameron, Y. Du, N.M. Adamcyzk and S.D. Davidson, "Molecular Layer Deposition of Organic and Hybrid Organic-Inorganic Films", Electrochemistry Society (ECS) Transactions 11(7), 81-90 (2007) in Atomic Layer Deposition Applications 3, edited by A. Londergan, J.W. Elam, O. van der Straten, S. De Gendt, S.F. Bent and S.B. Kang (The Electrochemical Society, Pennington, NJ, 2007).

257.     X.H. Liang, S.M. George, A.W. Weimer, N.H. Li, J. Blackson, J. Harris and P. Li, "Synthesis of a Novel Porous Polymer/Ceramic Composite Material by Low-Temperature Atomic Layer Deposition", Chem. Mater. 19, 5388-5394 (2007).

256.     Y. Du and S.M. George, "Molecular Layer Deposition of Nylon 66 Films Examined Using In Situ FTIR Spectroscopy" J. Phys. Chem. C 111, 8509-8517 (2007).

255.     L.F. Hakim, D.M. King, Y. Zhou, C.J. Gump, S.M. George and A.W. Weimer, “Nanoparticle Coating for Advanced Optical, Mechanical and Rheological Properties,” Adv. Funct. Mater. 17, 3175-3181 (2007).

254.     F.H. Fabreguette and S.M. George, "X-Ray Mirrors on Flexible Polymer Substrates Fabricated by Atomic Layer Deposition" Thin Solid Films 515, 7177-7180 (2007).

253.     J.A. McCormick, K.P. Rice, D.F. Paul, A.W. Weimer and S.M. George, "Al₂O₃ Atomic Layer Deposition on ZrO₂ Nanoparticles in a Rotary Reactor" Chem. Vapor Depos. 13, 491-498 (2007).

252.     X.H. Liang, L.F. Hakim, G.D. Zhan, J.A. McCormick, S.M. George, A.W. Weimer, J.A. Spencer II, K.J. Buechler, J. Blackson, C.J. Wood and J.R. Dorgan,  “Polymer/Ceramic Nanocomposites Produced by Extruding ALD Nanocoated Polymer Particles,”  J. Am Ceram. Soc. 90, 57-63 (2007). 

251.     J.A. McCormick, B.L. Cloutier, A.W. Weimer and S.M. George, "Rotary Reactor for Atomic Layer Deposition on Large Quantities of Nanoparticles", J. Vac. Sci. Technol. A 25, 67-74 (2007).

250.     Y. Du, X. Du and S. M. George, "Mechanism of Pyridine-Catalyzed SiO₂ Atomic Layer Deposition Studied by Fourier Transform Infrared Spectroscopy", J. Phys. Chem. C 111, 219-226 (2007).

249.     D.C. Miller, C.F. Herrmann, H.J. Maier, S.M. George, C.R. Stoldt and K. Gall, "Thermo-Mechanical Evolution of Multilayer Thin Films, Part II:  Microstructure Evolution in Au/Cr/Si Microcantilevers", Thin Solid Films 515, 3224-3240 (2007).

248.     D.C. Miller, C.F. Herrmann, H.J. Maier, S.M. George, C.R. Stoldt and K. Gall, "Thermo-Mechanical Evolution of Multilayer Thin Films, Part I:  Mechanical Behavior of Au/Cr/Si Microcantilevers", Thin Solid Films 515, 3208-3223 (2007).

247.     C.F. Herrmann, F. W. DelRio, D.C. Miller, S.M. George, V.M. Bright, J.L. Ebel, R.E. Strawser, R. Cortez and K.D. Leedy, "Alternative Dielectric Films for RF MEMS Capacitive Switches Deposited Using Atomic Layer Deposited Al₂O₃/ZnO Alloys”, Sensors and Actuators A 135, 262-272 (2007).

246.     L.F. Hakim, J.A. McCormick, G.D. Zhan, A.W. Weimer, P. Li and S.M. George, "Surface Modification of Titania Nanoparticles Using Ultrathin Ceramic Films", J. Am. Ceram. Soc. 89, 3070-3075 (2006).

245.     M.K. Tripp, C. Stampfer, D.C. Miller, T. Helbling, C.F. Herrmann, C. Hierold, K. Gall, S.M. George and V.M. Bright, "The Mechanical Properties of Atomic Layer Deposited Alumina for Use in Micro- and Nano-Electromechanical Systems", Sensors and Actuators A 130-131, 419-429 (2006).

244.     P.F. Carcia, R.S. McLean, M.H. Reilly, M.D. Groner and S.M. George, "Ca-Tests of Al₂O₃ Gas Diffusion Barriers Grown by Atomic Layer Deposition on Polymers", Appl. Phys. Lett. 89, 031915 (2006).

243.     Z.A. Sechrist, B.T. Schwartz, J.H. Lee, J.A. McCormick, R. Piestun, W. Park, and S.M. George, "Modification of Opal Photonic Crystals Using Al₂O₃ Atomic Layer Deposition", Chem. Mater. 18, 3562-3570 (2006).

242.     R.K. Grubbs and S.M. George, "Attenuation of Hydrogen Radicals Traveling under Flowing Gas Conditions Through Tubes of Different Materials ", J. Vac. Sci. Technol. A 24, 486-496 (2006).

241.     M.D. Groner, S.M. George, R.S. McLean and P.F. Carcia, "Gas Diffusion Barriers on Polymers Using Al₂O₃ Atomic Layer Deposition", Appl. Phys. Lett. 88, 051907 (2006).

240.     F.H. Fabreguette, R.A. Wind and S.M. George, "Ultra-high X-Ray Reflectivity from W/Al₂O₃ Multilayers Fabricated Using Atomic Layer Deposition", Appl. Phys. Lett. 88, 013116 (2006).

239.     M.D. Groner, S.M. George, R.S. McLean and P.F. Carcia, "Gas Diffusion Barriers on Polymers Using Al₂O₃ Atomic Layer Deposition", 48th Technical Conference Proceedings of the Society of Vacuum Coaters (SVC), pages 169-172 (2005).

238.     L.F. Hakim, J. Blackson, S.M. George and A.W. Weimer, "Nanocoating Individual Silica Nanoparticles by Atomic Layer Deposition in a Fluidized Bed Reactor", Chem. Vap. Deposition 11, 420-425 (2005).

237.     C.A. Wilson, R.K. Grubbs and S.M. George, "Nucleation and Growth during Al₂O₃ Atomic Layer Deposition on Polymers", Chem. Mater. 17, 5625-5634 (2005).

236.     Z.A. Sechrist, F.H. Fabreguette, O. Heintz, T.M. Phung, D.C. Johnson and S.M. George, "Optimization and Structural Characterization of W/Al₂O₃ Nanolaminates Grown Using Atomic Layer Deposition Techniques", Chem. Mater. 17, 3475-3485 (2005).

235.     J.D. Ferguson, K.J. Buechler, A.W. Weimer and S.M. George, "SnO₂ Atomic Layer Deposition on ZrO₂ and Al Nanoparticles:  Pathway to Enhanced Thermite Materials", Powder Technology 156, 154-163 (2005).

234.     M.J. Pellin, P.C. Stair, G. Xiong, J.W. Elam, J. Birrell, L. Curtiss, S.M. George, C.Y. Han, L. Iton, H. Kung, M. Kung and H.H. Wang, "Mesoporous Catalytic Membranes:  Synthetic Control of Pore Size and Wall Composition", Catalysis Letters 102, 127-130 (2005).

233.     L.F. Hakim, S.M. George and A.W. Weimer, "Conformal Nanocoating of Primary Zirconia Nanoparticles by Atomic Layer Deposition in a Fluidized Bed Reactor", Nanotechnology 16, S375-S381 (2005).

232.     C.F. Herrmann, F.H. Fabreguette, D.S. Finch, R. Geiss and S.M. George, "Multilayer and Functional Coatings on Carbon Nanotubes Using Atomic Layer Deposition", Appl. Phys. Lett. 87, Art. No. 123110 (2005). 

231.     D.C. Miller, C.F. Herrmann, H.J. Maier, S.M. George, C.R. Stoldt and K. Gall, "Intrinsic Stress Development and Microstructure Evolution of Au/Cr/Si Multilayer Thin Films Subject to Annealing", Scripta Materialia 52, 873-879 (2005).

230.     X. Du, Y. Du and S.M. George, “In Situ Examination of Tin Oxide Atomic Layer Deposition Using QCM and FTIR Techniques”, J. Vac. Sci. Technol. A 23, 581-588 (2005).

229.     M.K. Tripp, F.H. Fabreguette, C.H. Herrmann, S.M. George and V.M. Bright, "Multilayer Coating Technique to Enhance X-Ray Reflectivity of Polysilicon Micro-Mirrors at 1.54 Å Wavelength", Proceedings of SPIE 5720, 241-251 (2005).

228.     C.F. Herrmann, F.W. DelRio, S.M. George and V.M. Bright, "Properties of Atomic Layer Deposited Al₂O₃/ZnO Dielectric Films Grown at Low Temperature for RF MEMS", Proceedings of SPIE 5715, 159-166 (2005). 

227.     Y. Du, X. Du and S.M. George, “SiO₂ Film Growth at Low Temperatures by Catalyzed Atomic Layer Deposition in a Viscous Flow Reactor”, Thin Solid Films 491, 43-53 (2005).

226.     C.F. Herrmann, F.W. DelRio, V.M. Bright and S.M. George, “Conformal Hydrophobic Coatings Prepared Using Atomic Layer Deposition Seed Layers and Non-Chlorinated Hydrophobic Precursors”, J. Micromech. Microeng. 15, 984-992 (2005).

225.     F.H. Fabreguette, Z.A. Sechrist, J.W. Elam and S.M. George, “Quartz Crystal Microbalance Study of Tungsten Atomic Layer Deposition using WF₆ and Si₂H₆”, Thin Solid Films 488, 103-110 (2005).

224.     J.D. Ferguson, A.W. Weimer and S.M. George, “Surface Chemistry and Infrared Absorbance Changes during ZnO Atomic Layer Deposition on ZrO₂ and BaTiO₃ Particles”, J. Vac. Sci. Technol. A 23, 118-125 (2005).

223.     S.W. Kang, S.W. Rhee and S.M. George, “Infrared Spectroscopic Study of Atomic Layer Deposition (ALD) Mechanism for Hafnium Silicate Thin Films Using HfCl₂[N(SiMe₃)₂] and H₂O”,  J. Vac. Sci. Technol. A 22, 2392-2397 (2004).

222.     Y. Zhang, M.L. Dunn, K. Gall, J.W. Elam and S.M. George, “Suppression of Inelastic Deformation of Nanocoated Thin Film Microstructures”, J. Appl. Phys. 95, 8216-8225 (2004).

221.     J.R. Wank, S.M. George and A.W. Weimer, “Nanocoating Individual Cohesive Boron Nitride Particles in a Fluidized Bed by ALD”, Powder Technology 142, 59-69 (2004). 

220.     J.R. Wank, S.M. George and A.W. Weimer, “Coating Fine Nickel Particles with Al₂O₃ Utilizing an Atomic Layer Deposition-Fluidized Bed Reactor (ALD-FBR)”, J. Am. Ceramic Soc. 87, 762-765 (2004). 

219.     J.D. Ferguson, A.W. Weimer and S.M. George, "Atomic Layer Deposition of Al₂O₃ Films on Polyethylene Particles", Chem. Mater. 16, 5602-5609 (2004).

218.     R.M. Costescu, D.G. Cahill, F.H. Fabreguette, Z.A. Sechrist and S.M. George, " Ultra-Low Thermal Conductivity in W/Al₂O₃ Nanolaminates", Science 303, 989-990 (2004).

217.     R.K. Grubbs, N.J. Steinmetz and S.M. George, "Gas Phase Reaction Products during Tungsten Atomic Layer Deposition Using WF₆ and Si₂H₆", J. Vac. Sci. Technol. B 22, 1811-1821 (2004).

216.     J.D. Ferguson, E.R. Smith, A.W. Weimer and S.M. George, “Atomic Layer Deposition of SiO₂ at Room Temperature using TEOS and H₂O with NH₃ as the Catalyst”, J. Electrochem. Soc. 151, G528-G535 (2004).

215.     M.D. Groner, F.H. Fabreguette, J.W. Elam and S.M. George, “Low Temperature Al₂O₃ Atomic Layer Deposition”, Chem. Mater. 16, 639-645 (2004).

214.     R.K. Grubbs, J.W. Elam, C.E. Nelson and S.M. George, "Nucleation and Growth During Tungsten ALD on Al2O3 Surfaces and Al₂O₃ ALD on Tungsten Surfaces", Thin Solid Films 467, 16-27 (2004).

213.     J.D. Ferguson, A.R. Yoder, A.W. Weimer and S.M. George, “TiO₂ Atomic Layer Deposition on ZrO₂ Particles Using Alternating Exposures of TiCl₄ and H₂O”, Appl. Surf. Sci. 226, 393-404 (2004).

212.     K. Gall, M. L. Dunn, M. Hulse, D. Finch and S. M. George, "Effect of Al₂O₃ Nanocoatings on the Thermo-Mechanical Behavior of Au/Si MEMS Structures", Conference Proceedings of the IEEE International Reliability Physics Symposium, Dallas, Texas, March 30-April 4, 2003, pp. 463-472.

211.     M.N. Rocklein and S.M. George, "Temperature-Induced Apparent Mass Changes Observed during Quartz Crystal Microbalance Measurements of Atomic Layer Deposition", Anal. Chem. 75, 4975-4982 (2003). 

210.     J.W. Elam, D. Routkevitch, P.P. Markilovich and S.M. George, “Conformal Coating on Ultrahigh-Aspect-Ratio Nanopores of Anodic Alumina by Atomic Layer Deposition”, Chem. Mater. 15, 3507-3517 (2003). 

209.     M.D. Groner and S.M. George, "High-k Dielectrics Grown by Atomic Layer Deposition:  Capacitor and Gate Applications"  Chapter 10 in Interlayer Dielectrics for Semiconductor Technologies.  S.P. Murarka, M. Eizenbert and A.K. Sinha, Eds., (Elsevier Academic Press, Amsterdam, 2003) pp. 327-348.

208.     T.M. Mayer, J.W. Elam, S.M. George and P.G. Kotula, "Atomic Layer Deposition of Wear-Resistant Coatings for Micromechanical Devices", Appl. Phys. Lett. 82, 2883-2885 (2003). 

207.     J.W. Elam, C.A. Wilson, M.Schuisky, Z.A. Sechrist and S.M. George, "Improved Nucleation on TiN ALD Films on SiLK Low-k Polymer Dielectric Using an Al₂O₃ ALD Adhesion Layer", J. Vac. Sci. Technol. B 21, 1099-1107 (2003).

206.     J.W. Elam, M. Schuisky, J.D. Ferguson and S.M. George, "Surface Chemistry and Film Growth During TiN Atomic Layer Deposition using TDMAT and NH₃", Thin Solid Films 436, 145-156 (2003).

205.     J.A. Smith, F.E. Livingston and S.M. George, "Isothermal Desorption Kinetics of Crystalline H₂O, H₂¹⁸O and D₂O Ice Multilayers", J. Phys. Chem. B 107, 3871-3877 (2003). 

204.     K. Gall, M. Hulse, M.L. Dunn, D. Finch, S.M. George and B.A. Corff, "Thermo-Mechanical Response of Bare and Al₂O₃ Nanocoated Au/Si Bilayer Beams for MEMS", J. Mater. Res. 18, 1575-1587 (2003). 

203.     J.W. Elam, D. Routkevitch and S.M. George, "Properties of ZnO/Al2O3 Alloy Films Grown Using Atomic Layer Deposition Techniques", J. Electrochem. Soc. 150, G339-G347 (2003).

202.     J.W. Elam and S.M. George, "Growth of ZnO/Al₂O₃ Alloy Films Using Atomic Layer Deposition", Chem. Mater. 15, 1020-1028 (2003).

201.     N.D.Hoivik, J.W. Elam, R.J. Linderman, V.M. Bright, S.M. George and Y.C. Lee, "Atomic Layer Deposited Protective Coatings for Micro-Electromechanical Systems", Sensor Actuat. A 103, 100-108 (2003). 

200.     Y. Zhang, M.L. Dunn, J.W. Elam and S.M. George, "Suppression of Stress Relaxation in MEMS Multilayer Film Microstructures by Use of ALD Nanocoatings", Proceedings of IMECE'02, 2002 ASME International Mechanical Engineering Congress & Exposition, New Orleans, Lousiana, November 17-2002. 

199.     J.W. Elam, Z.A. Sechrist and S.M. George, "Atomic Layer Deposition of ZnO/Al₂O₃ Nanolaminates and Alloys:  Fabrication and Properties",  Proceedings of CIMTEC 2002, International Conferences on Modern Materials and Technologies, Florence, Italy, July 14-18, 2002. 

198.     N.D. Hoivik, J.W. Elam, S.M. George, K.C. Gupta, V.M. Bright and Y.C. Lee, "Atomic Layer Deposition (ALD) Technology for Reliable RF MEMS", in Proceedings of the IEEE MTT-S 2002 International Microwave Symposium, Seattle, WA, 2-7 June 2002, Symposium Digest, pp. 1229-1232. 

197.     M. Schuisky, J.W. Elam and S.M. George, "In Situ Resistivity Measurements During the Atomic Layer Deposition of ZnO and W Thin Films", Appl. Phys. Lett. 81, 180-182 (2002). 

196.     J.M. Jensen, A.B. Oelkers, R. Toivola, D.C. Johnson, J.W. Elam and S.M. George, "X-ray Reflectivity Characterization of ZnO/Al₂O₃ Multilayers Prepared Using Atomic Layer Deposition", Chem. Mater. 14, 2276-2282 (2002).

195.     M.D. Groner, J.W. Elam, F.H. Fabreguette and S.M. George, "Electrical Characterization of Thin Al₂O₃ Films Grown by Atomic Layer Deposition on Silicon and Various Metal Substrates", Thin Solid Films 413, 186-197 (2002).

194.     J.W. Elam, Z.A. Sechrist and S.M. George, "ZnO/Al₂O₃ Nanolaminates Fabricated by Atomic Layer Deposition:  Growth and Surface Roughness Measurements", Thin Solid Films 414, 43-55 (2002).

193.     J.W. Elam, M.D. Groner and S.M. George, "Viscous Flow Reactor with Quartz Crystal Microbalance for Thin Film Growth by Atomic Layer Deposition", Rev. Sci. Instrum. 73, 2981-2987 (2002). 

192.     J.D. Ferguson, A.W. Weimer and S.M. George, "Atomic Layer Deposition of Boron Nitride Using Sequential Exposures of BCl₃ and NH₃", Thin Solid Films 413, 16-25 (2002).

191.     F.E. Livingston, J.A. Smith and S.M. George, "General Trends for Bulk Diffusion in Ice and Surface Diffusion on Ice", J. Phys. Chem. A 106, 6309-6318 (2002).

190.     F.E. Livingston and S.M. George, "Effects of Sodium on HCl Hydrate Diffusion in Ice:  Evidence for Anion-Cation Trapping", J. Phys. Chem. A 106, 5114-5119 (2002).

189.     F.E. Livingston, S.M. George and R.K. Shori, "Optimization of a Rotary Q-Switched Er:YAG Laser", Rev. Sci. Instr. 73, 2526-2532 (2002).

188.     J.R. Wank, S.M. George, and A.W. Weimer, “Conformal Ultrathin Non-conducting coatings on Conducting Fine Metal Particles,” Proceedings of the 2002 International Conference on Functionally Graded Materials  (Metal Powder Industries Federation, Princeton, New Jersey, 2002) pp. 26-33.

187.     Wank, J.R, A.W. Weimer, J.D. Ferguson, and S.M. George, “Conformal Encapsulation of Fine Boron Niride Particles with Oxide Nanolayers,” in Functionally Graded Materials 2000, K. Trumble, K. Bowman, I. Reimanis, and S. Sampath, editors (The American Ceramic Society, Westerville, Ohio, 2001), Ceram. Trans. 114, 441-449 (2001).

186.     S.M. George, J.W. Elam, R.K. Grubbs and C.E. Nelson, "Nucleation and Growth During Tungsten Atomic Layer Deposition on Oxide Surfaces", in Mechanisms of Surface and Microstructure Evolution in Deposited Films and Film Structures,  Mat. Res. Soc. Sym. Proc. 672, O7.7.1-O7.7.7 (2001).

185.     J.R. Wank, S.M. George and A.W. Weimer, "Vibro-fluidization of Fine Boron Nitride Powder at Low Pressure", Powder Technology 121, 195-204 (2001).

184.     F.E. Livingston and S.M. George, "Diffusion Kinetics of HCl Hydrates in Ice Measured Using Infrared Laser Resonant Desorption Depth-Profiling", J. Phys. Chem. A 105, 5155-5164 (2001).

183.     J.W. Elam, C.E. Nelson, R.K. Grubbs and S.M. George, "Kinetics of the WF6 and Si2H6 Surface Reactions During Tungsten Atomic Layer Deposition", Surf. Sci. 479, 121-135 (2001).

182.     J.W. Elam, C.E. Nelson, R.K. Grubbs and S.M. George, "Nucleation and Growth During Tungsten Atomic Layer Deposition on SiO2 Surfaces", Thin Solid Films 386, 41-52 (2001).

181.     P.K. Hudson, K.L. Foster, M.A. Tolbert, S.M. George, S.R. Carlo and V.H. Grassian, "HBr Uptake on Ice:  Uptake Coefficient, H2O/HBr Hydrate Formation and H2O Desorption Kinetics", J. Phys. Chem. A 105, 694-702 (2001).

180.     C.E. Nelson, J.W. Elam, M.A. Tolbert and S.M. George, "H2O and HCl Adsorption on Single-Crystal a-Al2O3(0001) at Stratospheric Temperatures", Applied Surface Science 171, 21-33 (2001).

179.     F.E. Livingston, J.A. Smith and S.M. George, "Depth-Profiling and Diffusion Measurements in Ice Films Using Infrared Laser Resonant Desorption", Anal. Chem. 72, 5590-5599 (2000).

178.     S.M. George, J.D. Ferguson and J.W. Klaus, "Atom Layer Deposition of Thin Films Using Sequential Surface Reactions", in New Methods, Mechanisms and Models of Vapor Deposition, Mat. Res. Soc. Sym. Proc. 616, 93-101 (2000).

177.     J.D. Ferguson, A.W. Weimer and S.M. George, "Atomic Layer Deposition of SiO2 Films on BN Particles Using Sequential Surface Reactions", Chem. Mater. 12, 3472-3480 (2000).

176.     M.A. Cameron, I.P. Gartland, J.A. Smith, S.F. Diaz and S.M. George, "Atomic Layer Deposition of SiO2 and TiO2 in Alumina Tubular Membranes:  Pore Reduction and Effect of Surface Species on Gas Transport", Langmuir 16, 7435-7444 (2000).

175.     J.D. Ferguson, A.W. Weimer and S.M. George, "Atomic Layer Deposition of Ultrathin and Conformal Al2O3 Films on BN Particles", Thin Solid Films 371, 95-104 (2000).

174.     J.W. Elam, C.E. Nelson, M.A. Tolbert and S.M. George, "Adsorption and Desorption of HCl on a Single-Crystal a-Al2O3(0001) Surface", Surf, Sci. 450, 64-77 (2000).

173.     J.W. Klaus, S.J. Ferro and S.M. George, "Atomically Controlled Growth of Tungsten and Tungsten Nitride Using Sequential Surface Reactions", Appl. Surf. Sci. 162-163, 479-491 (2000).

172.     J.W. Klaus, S.J. Ferro and S.M. George, "Atomic Layer Deposition of Tungsten Using Sequential Surface Chemistry with a Sacrificial Stripping Reaction", Thin Solid Films 360, 145-153 (2000).

171.     J.W. Klaus and S.M. George, "SiO2 Chemical Vapor Deposition at Room Temperature Using SiCl4 + H2O with a NH3 Catalyst", J. Electrochem. Soc. 147, 2658-2664 (2000).

170.     J.W. Klaus and S.M. George, "Atomic Layer Deposition of SiO2 at Room Temperature Using NH3-Catalyzed Sequential Surface Reactions", Surf. Sci. 447, 81-90 (2000).

169.     J.W. Klaus, S.J. Ferro and S.M. George, "Atomic Layer Deposition of Tungsten Nitride Films Using Sequential Surface Reactions", J. Electrochem. Soc. 147, 1175-1181 (2000).

168.     J.D. Ferguson, A.W. Weimer and S.M. George, "Atomic Layer Deposition of Al2O3 and SiO2 on BN Particles Using Sequential Surface Reactions", Appl. Surf. Sci. 162-163, 280-292 (2000).