GWOL presently consists of two measurements facilities. One is a roughly 800 square foot facility that contains five 8 by 4 foot floating optical benches, hood for mixing chemicals, gas flows and air flows and some office space. This laboratory contains several laser systems (Nd:Yag, Dye) as well as a significant amount of high speed measurement equipment for time,frequency and wavelength domain measurements including various types of spectroscopy. A second roughly 250 square foot measurement laboratory contains a single stabilized optical bench and both Ar and Ti:Si (femtosecond as well as CW) laser systems. This laboratory is often well stocked with optical hardware necessary for complex optical exposure arrangements for multibeam holographic exposures as well as coincidence measurements.


Shared Facilities

      Shared facilities include a cleanroom and optical machine shop. The clean room contains lithography facilities for 2-3 micron lines with submicron alignment tolerance. Deposition and spinning equipment allows for planar deposition and measurement of nanometric layers. Various organic and inorganic materials can be handled in the facility. The equipment allows for integrated optical and organic light emitting and detecting structure fabrication. Also available to the use of GWOL personnel are the extensive microelectromechanical system (MEMS) fabrication facilities within the laboratories of Prof. Y. C. Lee of the Mechanical Engineering Department of the CoE.