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Mark Stoykovich

Assistant Professor

ECCH 136

(303) 492-6522

Education:

B.S., Massachusetts Institute of Technology, (2000)
PhD, University of Wisconsin-Madison, (2007)

Awards:

• Semiconductor Research Corporation (SRC) Graduate Fellowship (2003-2006)
• Finalist for the American Physical Society’s Frank J. Padden, Jr. award for graduate student research (2006)
• Best paper in session at TECHCON (2005)
• SRC inventor recognition award (2004-2005)
• Best poster/presentation at the SRC Graduate Fellowship Conference (2004)
• Best presentation award at the SRC Review, University of Wisconsin (2002 and 2005)

Selected Publications:

H. Kang, F. A. Detcheverry, A. N. Mangham, M. P. Stoykovich, K. Ch. Daoulas, R. J. Hamers, M. Müller, J. J. de Pablo, P. F. Nealey, “Hierarchical assembly of nanoparticle superstructures from block copolymer-nanoparticle composites,” Physical Review Letters, 100, 148303 (2008).

K. Ch. Daoulas, M. Müller, M. P. Stoykovich, H. Kang, J. J. de Pablo, P. F. Nealey, “Directed copolymer assembly on chemical substrate patterns: A phenomenological and Single-Chain-in-Mean-Field simulations study of the influence of roughness in the substrate pattern,” Langmuir, 24, 1284 (2008).

M. P. Stoykovich, K. Yoshimoto, P. F. Nealey, “Mechanical properties of polymer nanostructures:  Measurements based on deformation in response to capillary forces,” Applied Physics A, 90, 277 (2008)

M. P. Stoykovich, H. Kang, K. Ch. Daoulas, G. Liu, C.-C. Liu, J. J. de Pablo, M. Müller, P. F. Nealey, “Directed self-assembly of block copolymers for nanolithography: Fabrication of isolated features and essential integrated circuit geometries,” ACS Nano, 1(3), 168 (2007) (highlighted with cover illustration and perspectives article).

M. P. Stoykovich, E. W. Edwards, H. H. Solak, P. F. Nealey, “Phase behavior of symmetric ternary block copolymer – homopolymer blends in thin films and on chemically patterned surfaces,” Physical Review Letters, 97, 147802 (2006).

M. P. Stoykovich, P. F. Nealey, “Block copolymers and conventional lithography,” Materials Today, 9(9), 20 (2006) (invited review article).

 Research Interests:

Block copolymers, polymer self-assembly, nanostructured materials, advanced lithography and nanofabrication.

Directed self-assembly of block copolymers for nanolithography.

Block copolymers self-assembled in thin films form regular structures at the sub-50 nm scale, including lamellae, cylinders and spheres, that are suitable templates for patterning applications.  This patterning approach, known as block copolymer lithography, has been used in the past to nanofabricate devices such as quantum dot arrays and photonic crystals that require a high-density of periodic features.  In the near future, structures simultaneously patterned at varying densities and in more complex geometries will be required, for example in the critical layers of integrated circuits.  Our research applies heterogeneous surfaces to direct the self-assembly of polymeric films into useful, device-oriented structures for advanced patterning applications.  We focus on developing polymeric materials that self-assemble into novel structures, characterizing such structures in thin films and in the bulk, and demonstrating functional integrated circuits patterned using these approaches.

Designing porous membranes from self-assembled network morphologies.

Advancements in membrane technology and nanostructured materials will play a critical role in the development and improvement of alternative energy technologies.  Fuel cell technologies, for example, may achieve enhanced hydrogen production, storage, and utilization with appropriately designed nanostructured membranes.  We investigate the self-assembly of polymer materials into continuous network morphologies, specifically developing strategies for controlling organization of such structures at interfaces and in three dimensions.  Our research also aims to functionalize and test such nanostructured membranes for a range of applications.