ProcessVersion={
      Version=AutoBuilder 2.0
}
ProcessUnit={
      Unit=microns
}
Wafer={
      WaferID=w1
      Mask=GND
      LayerName=Substrate
      Material=SILICON
      Thickness=20.0
      Color=rgb-0-0-255
      Comment= 
}
Deposit={
      WaferID=w1
      DepositType=Stacked
      LayerName=Nitride
      Material=SI3N4
      Face=TOP
      Thickness=0.6
      Scf=1.0
      Color=rgb-0-255-255
      Comment= 
}
Deposit={
      WaferID=w1
      DepositType=Stacked
      LayerName=Poly0
      Material=POLYSILICON
      Face=TOP
      Thickness=0.5
      Scf=1.0
      Color=rgb-255-255-255
      Comment= 
}
Etch={
      WaferID=w1
      Mask=poly0
      EtchType=FrontLastLayer
      EtchUntil= 
      Face=TOP
      Depth=0.5
      Color=rgb-0-255-255
      SidewallAngle=0.0
      Offset=0.0
      Polarity=+
      Comment= 
}
Deposit={
      WaferID=w1
      DepositType=Conformal
      LayerName=Oxide1_1
      Material=PSG
      Face=TOP
      Thickness=1.25
      Scf=1.0
      Color=rgb-0-0-255
      Comment= 
}
Etch={
      WaferID=w1
      Mask=anchor1
      EtchType=FrontLastLayer
      EtchUntil= 
      Face=TOP
      Depth=1.25
      Color=rgb-255-255-255
      SidewallAngle=0.0
      Offset=0.0
      Polarity=-
      Comment= 
}
Etch={
      WaferID=w1
      Mask=anchor2
      EtchType=FrontLastLayer
      EtchUntil= 
      Face=TOP
      Depth=1.25
      Color=rgb-0-0-255
      SidewallAngle=0.0
      Offset=0.0
      Polarity=-
      Comment= 
}
Deposit={
      WaferID=w1
      DepositType=Conformal
      LayerName=Oxide1_2
      Material=PSG
      Face=TOP
      Thickness=0.75
      Scf=1.0
      Color=rgb-255-200-0
      Comment= 
}
Etch={
      WaferID=w1
      Mask=dimple
      EtchType=FrontLastLayer
      EtchUntil= 
      Face=TOP
      Depth=0.75
      Color=rgb-255-200-0
      SidewallAngle=0.0
      Offset=0.0
      Polarity=-
      Comment= 
}
Etch={
      WaferID=w1
      Mask=anchor1
      EtchType=FrontLastLayer
      EtchUntil= 
      Face=TOP
      Depth=0.75
      Color=rgb-255-255-0
      SidewallAngle=0.0
      Offset=0.0
      Polarity=-
      Comment= 
}
Etch={
      WaferID=w1
      Mask=anchor2
      EtchType=FrontLastLayer
      EtchUntil= 
      Face=TOP
      Depth=0.75
      Color=rgb-128-128-128
      SidewallAngle=0.0
      Offset=0.0
      Polarity=-
      Comment= 
}
Deposit={
      WaferID=w1
      DepositType=Conformal
      LayerName=Poly1
      Material=POLYSILICON
      Face=TOP
      Thickness=2.0
      Scf=1.0
      Color=rgb-255-255-0
      Comment= 
}
Etch={
      WaferID=w1
      Mask=poly1
      EtchType=FrontLastLayer
      EtchUntil= 
      Face=TOP
      Depth=2.0
      Color=rgb-192-192-192
      SidewallAngle=0.0
      Offset=0.0
      Polarity=+
      Comment= 
}
Etch={
      WaferID=w1
      Mask=hole1
      EtchType=FrontLastLayer
      EtchUntil= 
      Face=TOP
      Depth=2.0
      Color=rgb-255-0-0
      SidewallAngle=0.0
      Offset=0.0
      Polarity=-
      Comment= 
}
Etch={
      WaferID=w1
      Mask=anchor2
      EtchType=FrontLastLayer
      EtchUntil= 
      Face=TOP
      Depth=2.0
      Color=rgb-255-175-175
      SidewallAngle=0.0
      Offset=0.0
      Polarity=-
      Comment= 
}
Deposit={
      WaferID=w1
      DepositType=Conformal
      LayerName=Oxide2
      Material=PSG
      Face=TOP
      Thickness=0.75
      Scf=1.0
      Color=rgb-128-128-128
      Comment= 
}
Etch={
      WaferID=w1
      Mask=p12via
      EtchType=FrontLastLayer
      EtchUntil= 
      Face=TOP
      Depth=0.75
      Color=rgb-0-255-0
      SidewallAngle=0.0
      Offset=0.0
      Polarity=-
      Comment= 
}
Etch={
      WaferID=w1
      Mask=anchor2
      EtchType=FrontLastLayer
      EtchUntil= 
      Face=TOP
      Depth=0.75
      Color=rgb-255-0-255
      SidewallAngle=0.0
      Offset=0.0
      Polarity=-
      Comment= 
}
Deposit={
      WaferID=w1
      DepositType=Conformal
      LayerName=Poly2
      Material=POLYSILICON
      Face=TOP
      Thickness=1.5
      Scf=1.0
      Color=rgb-192-192-192
      Comment= 
}
Etch={
      WaferID=w1
      Mask=poly2
      EtchType=FrontLastLayer
      EtchUntil= 
      Face=TOP
      Depth=1.5
      Color=rgb-0-255-255
      SidewallAngle=0.0
      Offset=0.0
      Polarity=+
      Comment= 
}
Etch={
      WaferID=w1
      Mask=hole2
      EtchType=FrontLastLayer
      EtchUntil= 
      Face=TOP
      Depth=1.5
      Color=rgb-255-255-255
      SidewallAngle=0.0
      Offset=0.0
      Polarity=-
      Comment= 
}
Deposit={
      WaferID=w1
      DepositType=Conformal
      LayerName=Metal
      Material=GOLD
      Face=TOP
      Thickness=0.5
      Scf=1.0
      Color=rgb-255-0-0
      Comment= 
}
Etch={
      WaferID=w1
      Mask=metal
      EtchType=FrontLastLayer
      EtchUntil= 
      Face=TOP
      Depth=0.5
      Color=rgb-0-0-255
      SidewallAngle=0.0
      Offset=0.0
      Polarity=+
      Comment= 
}
SacrificialEtch={
      Material=PSG
      Comment= 
}