Recruiting, Collaborations & Funding

---

Our group is currently looking for two new postdoctoral research associates. A description of the possible research areas are described below:

1.  Polymer ALD.  ALD is defined by two sequential, self-limiting surface reactions.  ALD is useful for atomic layer controlled growth of inorganic and metallic films such as Al2O3 and W.  Similar methods can be applied to grow polymer films.  In this case, two bifunctional monomers can be employed to obtain "layer-by-layer" deposition.  We have recently grown polyamides using diamines and diacid chlorides as the bifunctional monomers.  We are continuing to study the surface chemistry of polymer ALD and to monitor polymer film growth using in situ methods.  We hope to optimize polymer ALD and then use this new capability to fabricate novel thin films and organic/inorganic composites.

2.  ALD on Polymers.  ALD can be performed at sufficiently low temperatures to deposit inorganic or metallic films on polymers.  These films may be useful as functional coatings or gas diffusion barriers.  We have investigated the nucleation and growth of ALD on polymers [C.A. Wilson et al., Chem. Mater. 17, 3475 (2005)] and demonstrated the excellent gas diffusion barrier properties of Al2O3 ALD films [M.D. Groner et al., Appl. Phys. Lett. 88, 051907 (2006)].  Our research is now aimed at fabricating ultrabarriers to prevent H2O and O2 permeation through polymers and encapsulating devices to provide a hermetic seal.  We also hope to combine ALD on polymers and Polymer ALD to fabricate multilayer barriers.

3.  ALD on NEMS/MEMS Devices.  The ability of ALD to grow conformal films on high aspect structures is extremely valuable for MEMS applications.  ALD coatings can be used to insulate, facilitate charge dissipation and functionalize the surface of MEMS devices [C.F. Herrmann et al., J. Micromech. Microeng. 15, 984 (2005)].  ALD can also be used as a fabrication tool to create novel structures.  This research is conducted in conjunction with Prof. Victor Bright's group in the Dept. of Mechnical Engineering.  New directions include NEMS nanofabrication using ALD together with electron beam lithography and ALD-coated carbon nanotube or nanowire sensors on NEMS/MEMS devices.

4.  ALD on Particles and Nanostructures.  ALD coatings are useful on particles and nanostructures for protection, insulation, energetics, adhesion promotion and catalytic activity [J.D. Ferguson et al., Powder Technology 156, 154 (2005)].  The ability of ALD to define novel core-shell structures is particularly interesting.  The research group is involved in a variety of particle ALD projects.  Many of these projects are collaborations with ALD NanoSolutions (http://www.aldnanosolutions.com).  We have also recently demonstrated ALD on multiwalled carbon nanotubes (CNTs) [C.F. Herrmann et al., Appl. Phys. Lett. 87, 123110 (2005)].  We are currently coating large quantities of CNTs in rotary reactors and also hope to explore ALD-modified CNTs as chemical sensors.

In addition, we are always looking for highly motivated researchers with an interest in thin films and nanotechnology. Please send inquiries to Steven George.

 

We would like to thank the follwing companies for their partnership in research: