249. M.K. Tripp, C. Stampfer, D.C. Miller, T. Helbling, C.F. Herrmann, C. Hierold, K. Gall, S.M. George and V.M. Bright, "The Mechanical Properties of Atomic Layer Deposited Alumina for Use in Micro- and Nano-Electromechanical Systems", Sensors and Actuators A 130-131, 419-429 (2006).
246. P.F. Carcia, R.S. McLean, M.H. Reilly, M.D. Groner and S.M. George, "Ca-Tests of Al2O3 Gas Diffusion Barriers Grown by Atomic Layer Deposition on Polymers", Appl. Phys. Lett. 89, 031915 (2006).
245. Z.A. Sechrist, B.T. Schwartz, J.H. Lee, J.A. McCormick, R. Piestun, W. Park, and S.M. George, "Modification of Opal Photonic Crystals Using Al2O3 Atomic Layer Deposition", Chem. Mater. 18, 3562-3570 (2006).
243. R.K. Grubbs and S.M. George, "Attenuation of Hydrogen Radicals Traveling under Flowing Gas Conditions Through Tubes of Different Materials ", Journal of Vacuum Science & Technology A 24, 486-496 (2006).
240. M.D. Groner, S.M. George, R.S. McLean and P.F. Carcia, "Gas Diffusion Barriers on Polymers Using Al2O3 Atomic Layer Deposition", Appl. Phys. Lett. 88, Art. No. 051907 (2006).
239. F.H. Fabreguette, R.W. Wind and S.M. George, "Ultra-high X-Ray Reflectivity from W/Al2O3 Multilayers Fabricated Using Atomic Layer Deposition", Appl. Phys. Lett. 88, Art. No. 013116 (2006).
238. L.F. Hakim, J. Blackson, S.M. George and A.W. Weimer, "Nanocoating Individual Silica Nanoparticles by Atomic Layer Deposition in a Fluidized Bed Reactor", Chem. Vap. Deposition 11, 420-425 (2005).
237. C.A. Wilson, R.K. Grubbs and S.M. George, "Nucleation and Growth during Al2O3 Atomic Layer Deposition on Polymers", Chem. Mater. 17, 5625-5634 (2005).
236. Z.A. Sechrist, F.H. Fabreguette, O. Heintz, T.M. Phung, D.C. Johnson and S.M. George, "Optimization and Structural Characterization of W/Al2O3 Nanolaminates Grown Using Atomic Layer Deposition Techniques", Chem. Mater. 17, 3475-3485 (2005).
235. J.D. Ferguson, K.J. Buechler, A.W. Weimer and S.M. George, "SnO2 Atomic Layer Deposition on ZrO2 and Al Nanoparticles: Pathway to Enhanced Thermite Materials", Powder Technology 156, 154-163 (2005).
234. M.J. Pellin, P.C. Stair, G. Xiong, J.W. Elam, J. Birrell, L. Curtiss, S.M. George, C.Y. Han, L.
Iton, H. Kung, M. Kung and H.H. Wang, "Mesoporous Catalytic Membranes: Synthetic Control of Pore Size and Wall Composition", Catalysis Letters 102, 127-130 (2005).
233. L.F. Hakim, S.M. George and A.W. Weimer, "Conformal Nanocoating of Primary Zirconia Nanoparticles by Atomic Layer Deposition in a Fluidized Bed Reactor", Nanotechnology 16, S375-S381 (2005).
232. C.F. Herrmann, F.H. Fabreguette, D.S. Finch, R. Geiss and S.M. George, "Multilayer and Functional Coatings on Carbon Nanotubes Using Atomic Layer Deposition", Appl. Phys. Lett. 87, Art. No. 123110 (2005).
231. D.C. Miller,
C.F. Herrmann, H.J. Maier, S.M. George, C.R. Stoldt and
K. Gall, "Intrinsic Stress Development and Microstructure
Evolution of Au/Cr/Si Multilayer Thin Films Subject to Annealing",
Scripta Materialia 52, 873-879 (2005).
230. X. Du, Y. Du and S.M. George, “In Situ Examination of Tin Oxide Atomic Layer Deposition Using QCM and FTIR Techniques”, J. Vac. Sci. Technol. A 23, 581-588 (2005).
229. M.K. Tripp,
F.H. Fabreguette, C.H. Herrmann, S.M. George and V.M. Bright,
"Multilayer Coating Technique to Enhance X-Ray Reflectivity
of Polysilicon Micro-Mirrors at 1.54 Å Wavelength",
Proceedings of SPIE 5720, 241-251 (2005).
228. C.F. Herrmann,
F.W. DelRio, S.M. George and V.M. Bright, "Properties
of Atomic Layer Deposited Al2O3/ZnO Dielectric Films Grown
at Low Temperature for RF MEMS", Proceedings of SPIE
5715, 159-166 (2005).
227. Y. Du, X. Du and S.M. George, “SiO2 Film Growth at Low Temperatures by Catalyzed Atomic Layer Deposition in a Viscous Flow Reactor”, Thin Solid Films 491, 43-53 (2005).
226. C.F. Herrmann, F.W. DelRio, V.M. Bright and S.M. George, “Conformal Hydrophobic Coatings Prepared Using Atomic Layer Deposition Seed Layers and Non-Chlorinated Hydrophobic Precursors”, J. Micromech. Microeng. 15, 984-992 (2005).
225. F.H. Fabreguette, Z.A. Sechrist, J.W. Elam and S.M. George, “Quartz Crystal Microbalance Study of Tungsten Atomic Layer Deposition using WF6 and Si2H6”, Thin Solid Films 488, 103-110 (2005).
224. J.D. Ferguson,
A.W. Weimer and S.M. George, “Surface Chemistry and
Infrared Absorbance Changes during ZnO Atomic Layer Deposition
on ZrO2 and BaTiO3 Particles”, J. Vac. Sci. Technol.
A 23, 118-125 (2005).
223. S.W. Kang,
S.W. Rhee and S.M. George, “Infrared Spectroscopic
Study of Atomic Layer Deposition (ALD) Mechanism for Hafnium
Silicate Thin Films Using HfCl2[N(SiMe3)2] and H2O”,
J. Vac. Sci. Technol. A 22, 2392-2397 (2004).
222. Y. Zhang,
M.L. Dunn, K. Gall, J.W. Elam and S.M. George, “Suppression
of Inelastic Deformation of Nanocoated Thin Film Microstructures”,
J. Appl. Phys. 95, 8216-8225 (2004).
221. J.R. Wank,
S.M. George and A.W. Weimer, “Nanocoating Individual
Cohesive Boron Nitride Particles in a Fluidized Bed by ALD”,
Powder Technology 142, 59-69 (2004).
220. J.R. Wank,
S.M. George and A.W. Weimer, “Coating Fine Nickel
Particles with Al2O3 Utilizing an Atomic Layer Deposition-Fluidized
Bed Reactor (ALD-FBR)”, J. Am. Ceramic Soc. 87, 762-765
(2004).
219. J.D. Ferguson,
A.W. Weimer and S.M. George, "Atomic Layer Deposition
of Al2O3 Films on Polyethylene Particles", Chem. Mater.
16, 5602-5609 (2004).
218. R.M. Costescu,
D.G. Cahill, F.H. Fabreguette, Z.A. Sechrist and S.M. George,
"Preparation of Ultra-Low Thermal Conductivity W/Al2O3
Nanolaminates", Science 303, 989-990 (2004).
217. R.K. Grubbs,
N.J. Steinmetz and S.M. George, "Gas Phase Reaction
Products during Tungsten Atomic Layer Deposition Using WF6
and Si2H6", J. Vac. Sci. Technol. B 22, 1811-1821 (2004).
216. J.D. Ferguson,
E.R. Smith, A.W. Weimer and S.M. George, “Atomic Layer
Deposition of SiO2 at Room Temperature using TEOS and H2O
with NH3 as the Catalyst”, J. Electrochem. Soc. 151,
G528-G535 (2004).
215. M.D. Groner,
F.H. Fabreguette, J.W. Elam and S.M. George, “Low
Temperature Al2O3 Atomic Layer Deposition”, Chem.
Mater. 16, 639-645 (2004).
214. R.K. Grubbs,
J.W. Elam, C.E. Nelson and S.M. George, "Nucleation
and Growth During Tungsten ALD on Al2O3 Surfaces and Al2O3
ALD on Tungsten Surfaces", Thin Solid Films 467, 16-27
(2004).
213. J.D. Ferguson,
A.R. Yoder, A.W. Weimer and S.M. George, “TiO2 Atomic
Layer Deposition on ZrO2 Particles Using Alternating Exposures
of TiCl4 and H2O”, Appl. Surf. Sci. 226, 393-404 (2004).
212. K. Gall,
M. L. Dunn, M. Hulse, D. Finch and S. M. George, "Effect
of Al2O3 Nanocoatings on the Thermo-Mechanical Behavior
of Au/Si MEMS Structures", Conference Proceedings of
the IEEE International Reliability Physics Symposium, Dallas,
Texas, March 30-April 4, 2003, pp. 463-472.
211. M.N. Rocklein
and S.M. George, "Temperature-Induced Apparent Mass
Changes Observed during Quartz Crystal Microbalance Measurements
of Atomic Layer Deposition", Anal. Chem. 75, 4975-4982
(2003).
210. J.W. Elam,
D. Routkevitch, P.P. Markilovich and S.M. George, “Conformal
Coating on Ultrahigh-Aspect-Ratio Nanopores of Anodic Alumina
by Atomic Layer Deposition”, Chem. Mater. 15, 3507-3517
(2003).
209. M.D. Groner
and S.M. George, "High-k Dielectrics Grown by Atomic
Layer Deposition: Capacitor and Gate Applications"
Chapter 10 in Interlayer Dielectrics for Semiconductor Technologies.
S.P. Murarka, M. Eizenbert and A.K. Sinha, Eds., (Elsevier
Academic Press, Amsterdam, 2003) pp. 327-348.
208. T.M. Mayer,
J.W. Elam, S.M. George and P.G. Kotula, "Atomic Layer
Deposition of Wear-Resistant Coatings for Micromechanical
Devices", Appl. Phys. Lett. 82, 2883-2885
(2003).
207. J.W. Elam,
C.A. Wilson, M.Schuisky, Z.A. Sechrist and S.M. George,
"Improved Nucleation on TiN ALD Films on SiLK Low-k
Polymer Dielectric Using an Al2O3 ALD Adhesion Layer",
J. Vac. Sci. Technol. B 21, 1099-1107 (2003).
206. J.W. Elam,
M. Schuisky, J.D. Ferguson and S.M. George, "Surface
Chemistry and Film Growth During TiN Atomic Layer Deposition
using TDMAT and NH3", Thin Solid Films 436,
145-156 (2003).
204. K. Gall,
M. Hulse, M.L. Dunn, D. Finch, S.M. George and B.A. Corff,
"Thermo-Mechanical Response of Bare and Al2O3 Nanocoated
Au/Si Bilayer Beams for MEMS", J. Mater. Res. 18, 1575-1587
(2003).
203. J.W. Elam,
D. Routkevitch and S.M. George, "Properties of ZnO/Al2O3
Alloy Films Grown Using Atomic Layer Deposition Techniques",
J. Electrochem. Soc. 150, G339-G347 (2003).
202. J.W. Elam
and S.M. George, "Growth of ZnO/Al2O3 Alloy Films Using
Atomic Layer Deposition", Chem. Mater. 15,
1020-1028 (2003).
201. N.D.Hoivik,
J.W. Elam, R.J. Linderman, V.M. Bright, S.M. George and
Y.C. Lee, "Atomic Layer Deposited Protective Coatings
for Micro-Electromechanical Systems", Sensor Actuat.
A 103, 100-108 (2003).
197. M. Schuisky,
J.W. Elam and S.M. George, "In Situ Resistivity Measurements
During the Atomic Layer Deposition of ZnO and W Thin Films",
Appl. Phys. Lett. 81, 180-182 (2002).
196. J.M. Jensen,
A.B. Oelkers, R. Toivola, D.C. Johnson, J.W. Elam and S.M.
George, "X-ray Reflectivity Characterization of ZnO/Al2O3
Multilayers Prepared Using Atomic Layer Deposition",
Chem. Mater. 14, 2276-2282 (2002).
195. M.D. Groner,
J.W. Elam, F.H. Fabreguette and S.M. George, "Electrical
Characterization of Thin Al2O3 Films Grown by Atomic Layer
Deposition on Silicon and Various Metal Substrates",
Thin Solid Films 413, 186-197 (2002).
194. J.W. Elam,
Z.A. Sechrist and S.M. George, "ZnO/Al2O3 Nanolaminates
Fabricated by Atomic Layer Deposition: Growth and Surface
Roughness Measurements", Thin Solid Films
414, 43-55 (2002).
193. J.W. Elam,
M.D. Groner and S.M. George, "Viscous Flow Reactor
with Quartz Crystal Microbalance for Thin Film Growth by
Atomic Layer Deposition", Rev. Sci. Instrum.
73, 2981-2987 (2002).
192. J.D. Ferguson,
A.W. Weimer and S.M. George, "Atomic Layer Deposition
of Boron Nitride Using Sequential Exposures of BCl3 and
NH3", Thin Solid Films 413, 16-25 (2002).
185. J.R. Wank,
S.M. George and A.W. Weimer, "Vibro-fluidization of
Fine Boron Nitride Powder at Low Pressure", Powder
Technology 121, 195-204 (2001).
183. J.W. Elam,
C.E. Nelson, R.K. Grubbs and S.M. George, "Kinetics
of the WF6 and Si2H6 Surface Reactions During Tungsten Atomic
Layer Deposition", Surf. Sci. 479, 121-135
(2001).
182. J.W. Elam,
C.E. Nelson, R.K. Grubbs and S.M. George, "Nucleation
and Growth During Tungsten Atomic Layer Deposition on SiO2
Surfaces", Thin Solid Films 386, 41-52 (2001).
177. J.D. Ferguson,
A.W. Weimer and S.M. George, "Atomic Layer Deposition
of SiO2 Films on BN Particles Using Sequential Surface Reactions",
Chem. Mater. 12, 3472-3480 (2000).
176. M.A. Cameron,
I.P. Gartland, J.A. Smith, S.F. Diaz and S.M. George, "Atomic
Layer Deposition of SiO2 and TiO2 in Alumina Tubular Membranes:
Pore Reduction and Effect of Surface Species on Gas Transport",
Langmuir 16, 7435-7444 (2000).
175. J.D. Ferguson,
A.W. Weimer and S.M. George, "Atomic Layer Deposition
of Ultrathin and Conformal Al2O3 Films on BN Particles",
Thin Solid Films 371, 95-104 (2000).
173. J.W. Klaus,
S.J. Ferro and S.M. George, "Atomically Controlled
Growth of Tungsten and Tungsten Nitride Using Sequential
Surface Reactions", Appl. Surf. Sci. 162-163,
479-491 (2000).
172. J.W. Klaus,
S.J. Ferro and S.M. George, "Atomic Layer Deposition
of Tungsten Using Sequential Surface Chemistry with a Sacrificial
Stripping Reaction", Thin Solid Films 360,
145-153 (2000).
171. J.W. Klaus
and S.M. George, "SiO2 Chemical Vapor Deposition at
Room Temperature Using SiCl4 + H2O with a NH3 Catalyst",
J. Electrochem. Soc. 147, 2658-2664 (2000).
170. J.W. Klaus
and S.M. George, "Atomic Layer Deposition of SiO2 at
Room Temperature Using NH3-Catalyzed Sequential Surface
Reactions", Surf. Sci. 447, 81-90 (2000).
169. J.W. Klaus,
S.J. Ferro and S.M. George, "Atomic Layer Deposition
of Tungsten Nitride Films Using Sequential Surface Reactions",
J. Electrochem. Soc. 147, 1175-1181 (2000).
168. J.D. Ferguson,
A.W. Weimer and S.M. George, "Atomic Layer Deposition
of Al2O3 and SiO2 on BN Particles Using Sequential Surface
Reactions", Appl. Surf. Sci. 162-163, 280-292
(2000).
Back
to Homepage
