Atomic Layer Deposition of Ceramic Materials on Particles

The properties of nanoscale materials can be vastly different than those of the bulk. Atomic layer deposition (ALD) is being used to deposit various semiconducting and insulating films on particle surfaces. Specific metal oxide materials of interest have been alumina, zinc oxide, titania, silica, hafnia, as well as metal nitrides including those of titanium, silicon and hafnium. The optical properties of nanothick UV-absorbing materials have been studied for the fabrication of novel sunscreen materials, as well as UV-inert coatings to quench the photoactivity of titania surfaces while not affecting the optical properties of the core. This work is performed using scalable fluidized bed reactors, which can operate using 10-100 gram samples at the lab scale to kilogram-sized batches at the pilot scale, and beyond. There are innumerable applications where ALD can be a disruptive technology and can provide raw materials savings due to precision film growth, while enhancing overall end-use performance. Many applications are currently being pursued, in order to integrate this unique branch of nanotechnology into everyday products.

(Published in Advanced Functional Materials)

(Published in Surface & Coatings Technology)

First Author Publications List

D.M. King, J. Li, K.S. Barrett, A.W. Weimer, Insulating metal particles as novel underfill material for high thermal conductivity composite epoxy, Compos. Sci. & Technol. (2009) to be submitted.

D.M. King, S.I. Johnson, J. Li, X. Du, A.W. Weimer, Quantum confined ZnO nanostructures on particles via atomic layer deposition in scalable reactors, Nanotechnology (2009) submitted.

D.M. King, J. Li, X.H. Liang, S.I. Johnson, M.M. Channel, A.W. Weimer, Crystal phase evolution in quantum confined ZnO domains on particles via atomic layer deposition, Cryst. Growth & Des. (2009) in press.

D.M. King, Y. Zhou, L.F. Hakim, X.H. Liang, P. Li, A.W. Weimer, In situ synthesis of TiO2-functionalized metal nanoparticles, Ind. Eng. Chem. Res. 48 (2009) 352-360.

D.M. King, X. Du, A.S. Cavanagh, A.W. Weimer, Quantum confinement in amorphous TiO2 films studied using atomic layer deposition, Nanotechnology 19 (2008) 445401.

D.M. King, X.H. Liang, P. Li, S.M. George, A.W. Weimer, Low-temperature atomic layer deposition of ZnO films on particles in a fluidized bed reactor, Thin Solid Films 516 (2008) 8517-8523.

D.M. King, X.H. Liang, B.B. Burton, M.K. Akhtar, A.W. Weimer, Passivation of pigment-grade TiO2 particles using nano-thick atomic layer deposited SiO2 films, Nanotechnology 19 (2008) 255604.

D.M. King, X.H. Liang, Y. Zhou, C.S. Carney, L.F. Hakim, P. Li, A.W. Weimer, Atomic layer deposition of TiO2 films on particles in a fluidized bed reactor, Powder Technol. 183 (2008) 356-363.

D.M. King, X.H. Liang, C.S. Carney, L.F. Hakim, P. Li, A.W. Weimer, Atomic layer deposition of UV-Absorbing ZnO films on SiO2 and TiO2 nanoparticles using a fluidized bed reactor, Adv. Funct. Mater. 18 (2008) 607-615.

D.M. King, J.A. Spencer, X.H. Liang, L.F. Hakim, A.W. Weimer, Atomic layer deposition on particles using a fluidized bed reactor with in situ mass spectrometry, Surf. Coat. Technol. 201 (2007) 9163–9171.

D.M. King, Z. Wang, H.J. Palmer, B.A. Holm, R.H. Notter, Bulk shear viscosities of endogenous and exogenous lung surfactants, Am. J. Physiol. – Lung. Cell Mol. Physiol. 282 (2002) L277–L284.

D.M. King, Z. Wang, J.W. Kendig, H.J. Palmer, B.A. Holm, R.H. Notter, Concentration-dependent, temperature-dependent non-Newtonian viscosity of lung surfactant dispersions, Chem. Phys. Lipids 112-1 (2001) 11-19.

EDUCATION:
B.S., M.S. - Chemical Engineering, University of Rochester, Rochester, NY
M.S. - Materials Science, University of Vermont, Burlington, VT