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31. Macromolecules, 2010, 43, 2334-2342. |
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Remediation of line edge roughness in chemical nano-patterns by the directed assembly of overlying block copolymer films. M. P. Stoykovich, K. Ch. Daoulas, M. Müller, H. Kang, J. J. de Pablo, P. F. Nealey. |
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30. Small, 2009, 5(23), 2703-2709. |
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Curvilinear electronics formed using silicon membrane circuits and elastomeric transfer elements. H. C. Ko, G. Shin, S. Wang, M. P. Stoykovich, J. W. Lee, D.-H. Kim, J. S. Ha, Y. Huang, K.-C. Hwang, J. A. Rogers.
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29. Applied Physics Letters, 2009, 95, 181912. |
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Mechanics of hemispherical electronics. S. Wang, J. Xiao, I. Jung, J. Song, H. C. Ko, M. P. Stoykovich, Y. Huang, K.-C. Hwang, J. A. Rogers. |
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Selected Publications: |
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Full Publication List: University of Colorado (2010 - ) |
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(2002 - 2009) |
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28. Journal of Applied Physics, 2009, 105, 123516. |
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Mechanics of noncoplanar mesh design for stretchable electronic circuits. J. Song, Y. Huang, J. Xiao, S. Wang, K.-C. Hwang, H. C. Ko, D.-H. Kim, M. P. Stoykovich, J. A. Rogers. |
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27. Macromolecules, 2009, 43, 3063-3072. |
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Phase behavior and dimensional scaling of symmetric block copolymer-homopolymer ternary blends in thin films. G. L. Liu, M. P. Stoykovich, S. Ji, K. O. Stuen, G. S. W. Craig, P. F. Nealey. |
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26. Nature, 2008, 454, 748-753. |
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A hemispherical electronic eye camera based on compressible silicon optoelectronics. H. C. Ko, M. P. Stoykovich, J. Song, V. Malyarchuk, W. M. Choi, C. J. Yu, J. B. Geddes III, J. Xiao, S. Wang, Y. Huang, J. A. Rogers. |
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25. Physical Review Letters, 2008, 100, 148303. |
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Hierarchical assembly of nanoparticle superstructures from block copolymer-nanoparticle composites. H. Kang, F. A. Detcheverry, A. N. Mangham, M. P. Stoykovich, K. Ch. Daoulas, R. J. Hamers, M. Müller, J. J. de Pablo, P. F. Nealey . |
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24. Langmuir, 2008, 24, 1284. |
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Directed copolymer assembly on chemical substrate patterns: A phenomenological and Single-Chain-in-Mean-Field simulations study of the influence of roughness in the substrate pattern. K. Ch. Daoulas, M. Müller, M. P. Stoykovich, H. Kang, J. J. de Pablo, P. F. Nealey . |
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23. Applied Physics A, 2008, 90, 277. |
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Mechanical properties of polymer nanostructures: Measurements based on deformation in response to capillary forces. M. P. Stoykovich, K. Yoshimoto, P. F. Nealey. |
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22. ACS Nano, 2007, 1(3), 168. |
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Directed self-assembly of block copolymers for nanolithography: Fabrication of isolated features and essential integrated circuit geometries. M. P. Stoykovich, H. Kang, K. Ch. Daoulas, G. Liu, C.-C. Liu, J. J. de Pablo, M. Müller, P. F. Nealey. |
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21. Chemistry of Materials, 2007, 19, 4538. |
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Directed assembly of cylinder-forming block copolymers into patterned structures to fabricate arrays of spherical domains and nanoparticles. Y.-H. La, M. P. Stoykovich, S.-M. Park, P. F. Nealey. |
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20. Journal of Applied Physics, 2007, 102, 013528. |
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Measurement of the x-ray dose-dependent glass transition temperature of structured polymer films by x-ray diffraction. H. R. Keymeulen, A. Diaz, H. H. Solak, C. David, F. Pfeiffer, B. D. Patterson, J. F. van der Veen, M. P. Stoykovich, P. F. Nealey. |
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19. Microelectronic Engineering, 2007, 84(5-8), 700. |
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20 nm Line/space patterns in HSQ fabricated by EUV interference lithography. Y. Ekinci, H. H. Solak, C. Padeste, J. Gobrecht, M. P. Stoykovich, P. F. Nealey. |
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18. Advanced Materials, 2007, 19, 607. |
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Directed assembly of lamellae-forming block copolymers using chemically and topographically patterned substrates. S.-M. Park, M. P. Stoykovich, R. Ruiz, Y. Zhang, C. T. Black, P. F. Nealey. |
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17. Macromolecules, 2007, 40(1), 90. |
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Dimensions and shapes of block copolymer domains assembled on lithographically defined chemically patterned substrates. E. W. Edwards, M. Muller, M. P. Stoykovich, H. H. Solak, J. J. de Pablo, P. F. Nealey. |
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16. Physical Review Letters, 2006, 97, 147802. |
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Phase behavior of symmetric ternary block copolymer-homopolymer blends in thin films and on chemically patterned surfaces. M. P. Stoykovich, E. W. Edwards, H. H. Solak, P. F. Nealey. |
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15. J. of Polymer Science B: Poly. Phys., 2006, 44(18), 2589. |
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Directed assembly of copolymer materials on patterned substrates: Balance of simple symmetries in complex structures. K. Ch. Daoulas, M. Müller, M. P. Stoykovich, Y. J. Papakonstantopoulos, S.-M. Park, J. J. de Pablo, P. F. Nealey, H. H. Solak. |
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14. Materials Today, 2006, 9(9), 20. |
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13. Macromolecules, 2006, 39(16), 5466. |
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Defect structures in thin films of a lamellar block copolymer self-assembled on neutral homogeneous and chemically nanopatterned surfaces. S. O. Kim, B. H. Kim, K. Kim, C. M. Koo, M. P. Stoykovich, P. F. Nealey, H. H. Solak. |
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12. Macromolecules, 2006, 39(10), 3598. |
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Long-range order and orientation of cylinder-forming block copolymers on chemically nanopatterned striped surfaces. E. W. Edwards, M. P. Stoykovich, H. H. Solak, P. F. Nealey. |
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11. Physical Review Letters, 2006, 96, 036104. |
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Fabrication of complex three-dimensional nanostructures from self-assembling block copolymer materials on two-dimensional chemically patterned templates with mismatched symmetry. K. Ch. Daoulas, M. Müller, M. P. Stoykovich, S.-M. Park, Y. J. Papakonstantopoulos, J. J. de Pablo, P. F. Nealey, H. H. Solak. |
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10. J. Vac. Sci. Technol. B, 2006, 24(1), 340. |
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Binary blends of diblock copolymers as an efficient route to multiple length scales in perfect directed self-assembly of diblock copolymer thin films. E. W. Edwards, M. P. Stoykovich, H. H. Solak, P. F. Nealey. |
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9. Proc. IEEE: IEDM, 2006, 356. |
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Self-assembling resists for nanolithography. P. F. Nealey, E. W. Edwards, M. Müller, M. P. Stoykovich, H. H. Solak, J. J. de Pablo.
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8. J. of Polymer Science B: Poly. Phys., 2005, 43(23), 3444. |
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Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates. E. W. Edwards, M. P. Stoykovich, M. Müller, H. H. Solak, J. J. de Pablo, P. F. Nealey. |
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7. Science, 2005, 308, 1442. |
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Directed assembly of block copolymer blends into nonregular device-oriented structures. M. P. Stoykovich, M. Müller, S. O. Kim, H. H. Solak, J. J. de Pablo, P. F. Nealey. |
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6. J. Vac. Sci. Technol. B., 2005, 23(1), 138. |
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Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography. I. Junarsa, M. P. Stoykovich, P. F. Nealey, Y. Ma, F. Cerrina, H. H. Solak. |
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5. Journal of Applied Physics, 2004, 96, 1857. |
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A two-dimensional model of the deformation of photoresist structures using elastoplastic polymer properties. K. Yoshimoto, M. P. Stoykovich, H. B. Cao, W. J. Drugan, J. J. de Pablo, P. F. Nealey. |
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4. Nature, 2003, 424, 411. |
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Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates. S. O. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. de Pablo, P. F. Nealey. |
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3. Advanced Materials, 2003, 15(14), 1180. |
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Deformation of nanoscopic polymer structures in response to well-defined capillary forces. M. P. Stoykovich, H. B. Cao, K. Yoshimoto, L. E. Ocola, P. F. Nealey. |
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2. The Encyclopedia of Materials: Science and Technology, 2003, Elsevier. |
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Nanolithographic polymer structures: Mechanical properties. P. F. Nealey, M. P. Stoykovich, K. Yoshimoto, H. B. Cao.
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1. Polymer Composites, 2002, 23(4), 479. |
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Monitoring the reaction progress of a high-performance phenylethynyl-terminated poly(etherimide). Part II: Advancement of glass transition temperature. T. A. Bullions, M. P. Stoykovich, J. E. McGrath, A. C. Loos. |
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· Curvilinear electronics formed using silicon membrane circuits and elastomeric transfer elements. Small, 2009, 5(23), 2703-2709. PDF · A hemispherical electronic eye camera based on compressible silicon optoelectronics. Nature, 2008, 454, 748-753. PDF · Directed self-assembly of block copolymers for nanolithography: Fabrication of isolated features and essential integrated circuit geometries. ACS Nano, 2007, 1(3), 168. PDF · Block copolymers and conventional lithography. Materials Today, 2006, 9(9), 20. · Directed assembly of block copolymer blends into nonregular device-oriented structures. Science, 2005, 308, 1442. PDF · Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates. Nature, 2003, 424, 411. PDF
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32. J. Physical Chemistry C, 2011, 115(5), 1793-1799. |
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Solvent-dependent surface plasmon response and oxidation of copper nanocrystals. K. P. Rice, E. J. Walker, Jr., M. P. Stoykovich, A. E. Saunders. |
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