Mark Stoykovich

Mark StoykovichAssistant Professor
(303) 492-6522
Curriculum Vitae
Stoykovich Research Group


B.S., Massachusetts Institute of Technology, (2000)
PhD, University of Wisconsin-Madison, (2007)


  • College of Engineering Dean’s Faculty Fellowship 2011-12
  • Semiconductor Research Corporation (SRC) Graduate Fellowship (2003-2006)
  • Finalist for the American Physical Society’s Frank J. Padden, Jr. award for graduate student research (2006)
  • Best paper in session at TECHCON (2005)
  • SRC inventor recognition award (2004-2005)
  • Best poster/presentation at the SRC Graduate Fellowship Conference (2004)
  • Best presentation award at the SRC Review, University of Wisconsin (2002 and 2005)

Selected Publications

  • M. P. Stoykovich, K. Ch. Daoulas, M. Müller, H. Kang, J. J. de Pablo, P. F. Nealey, “Remediation of line edge roughness in chemical nano-patterns by the directed assembly of overlying block copolymer films,” Macromolecules, 43, 2334-2342 (2010).
  • H. C. Ko, G. Shin, S. Wang, M. P. Stoykovich, J. W. Lee, D.-H. Kim, J. S. Ha, Y. Huang, K.-C. Hwang, J. A. Rogers, “Curvilinear electronics formed using silicon membrane circuits and elastomeric transfer elements,” Small, 5(23), 2703-2709 (2009).
  • H. C. Ko, M. P. Stoykovich, J. Song, V. Malyarchuk, W. M. Choi, C. J. Yu, J. B. Geddes III, J. Xiao, S. Wang, Y. Huang, J. A. Rogers, “A hemispherical electronic eye camera based on compressible silicon optoelectronics,” Nature, 454, 748-753 (2008).
  • M. P. Stoykovich, H. Kang, K. Ch. Daoulas, G. Liu, C.-C. Liu, J. J. de Pablo, M. Müller, P. F. Nealey, “Directed self-assembly of block copolymers for nanolithography: Fabrication of isolated features and essential integrated circuit geometries,” ACS Nano, 1(3), 168 (2007).
  • M. P. Stoykovich, P. F. Nealey, “Block copolymers and conventional lithography,” Materials Today, 9(9), 20 (2006).
  • M. P. Stoykovich, M. Müller, S. O. Kim, H. H. Solak, E. W. Edwards, J. J. de Pablo, P. F. Nealey, “Directed assembly of block copolymer blends into nonregular device-oriented structures,” Science, 308, 1442 (2005).
  • S. O. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. de Pablo, P. F. Nealey, “Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates,” Nature, 424, 411 (2003).

Research Interests

Block copolymers, polymer self-assembly, nanostructured materials, advanced lithography and nanofabrication.

Directed self-assembly of block copolymers for nanolithography.
Block copolymers self-assembled in thin films form regular structures at the sub-50 nm scale, including lamellae, cylinders and spheres, that are suitable templates for patterning applications. This patterning approach, known as block copolymer lithography, has been used in the past to nanofabricate devices such as quantum dot arrays and photonic crystals that require a high-density of periodic features. In the near future, structures simultaneously patterned at varying densities and in more complex geometries will be required, for example in the critical layers of integrated circuits. Our research applies heterogeneous surfaces to direct the self-assembly of polymeric films into useful, device-oriented structures for advanced patterning applications. We focus on developing polymeric materials that self-assemble into novel structures, characterizing such structures in thin films and in the bulk, and demonstrating functional integrated circuits patterned using these approaches.

Polymer-polymer interfaces.
Polymer-polymer interfaces are often generated spontaneously through phase separation processes in copolymers or polymer blends, and dominate the structural, mechanical, optical, and transport properties of such systems. These interfaces are relatively soft/flexible and therefore their shape is influenced by the interface bending rigidity (a function of the Flory-Huggins parameter), capillary waves, and thermal fluctuations. We study, using experiments and simulations, the interfaces between lamellar block copolymer domains focusing upon their impact as line edge roughness in the resulting nanopatterns.

Designing porous membranes from self-assembled network morphologies.
Advancements in membrane technology and nanostructured materials will play a critical role in the development and improvement of alternative energy technologies. Fuel cell technologies, for example, may achieve enhanced hydrogen production, storage, and utilization with appropriately designed nanostructured membranes. We investigate the self-assembly of polymer materials into continuous network morphologies, specifically developing strategies for controlling organization of such structures at interfaces and in three dimensions. Our research also aims to functionalize and test such nanostructured membranes for a range of applications.